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[1] Asgari A;Karamad M;Kalafi M.Modeling of trap-assisted tunneling in AlGaN/GaN heterostructure field effect transistors with different Al mole fractions[J].Superlattices and Microstructures,200640:603.
[2] Hasegawa H;Inagaki T;Ootomo S.Mechanisms of current collapse and gate leakage currents in AlGaN/GaN heterostructure field effect transistors[J].J Vac Sci Technol B-Microelectronics and Nanometer Structures,200321(04):1844.
[3] Del Alamo J A;Joh J.GaN HEMT reliability[J].Microelectronics Reliability,200949:1200.
[4] Tartarin J G.Diagnostic tools for accurate reliability investigations of GaN devices[A].,2011:452.
[5] Rao H;Bosman G.Study of RF reliability of GaN HEMTs using low-frequency noise spectroscopy[J].IEEE Trans Device Mater Reliab,201212(01):31.
[6] Marko P;Meneghini M;Bychikhin S.Noise and electroluminescence analysis of stress-induced percolation paths in AlGaN/GaN high electron mobility transistors[J].Microelectronics Reliability,201252:2194.
[7] Kotchetkov D;Balandin A A.Carrier-density fluctuation noise and the interface trap density in GaN/AlGaN HFETs[A].,2001:680.
[8] Han I K;Lee J I.Low frequency noise in HEMT structure[J].Journal of the Korean Physical Society,200139:S322.
[9] Katz O;Bahir G;Salzman J.Low-frequency 1/f noise and persistent transients in AlGaN-3aN HFETs[J].IEEE Electron Device Lett,200526(06):345.
[10] Rao H;Bosman G.Simultaneous low-frequency noise characterization of gate and drain currents in AlGaN/GaN high electron mobility transistors[J].Journal of Applied Physics,2009106:103712.
[11] Rao H;Bosman G.Device reliability study of AlGaN/GaN high electron mobility transistors under high gate and channel electric fields via low frequency noise spectroscopy[J].Microelectronics Reliability,201050:1528.
[12] Marko P;Alexewicz A;Hilt O.Random telegraph signal noise in gate current of unstressed and reverse bias-stressed AlGaN/GaN high electron mobility transistors[J].Applied Physics Letters,2012100:143507.
[13] Karboyan S;Tartarin J G;Labat N.Gate and drain low frequency noise of ALGAN/GAN HEMTs featuring high and low gate leakage currents[A].,2013:1.
[14] Rendek K;Satka A;Donoval D.Measurement set-up for lowfrequency noise characterization of GaN HEMT transistors[A].,2012:1.
[15] Satka A;Rendek K;Priesol J.Relaxation of low-frequency noise in AlGaN/GaN HEMTs[A].Smolenice,Slovakia,2012:19.
[16] Kumar N;Kumar P;Kumar A.AlGaN/GaN HFET:operating principle and noise performance[J].International Journal of Advanced Trends in Computer Science and Engineering,20132(04):86.
[17] Tartarin J G;Karboyan S;Carisetti D.Gate defects in AlGaN/GaN HEMTs revealed by low frequency noise measurements[A].,2013
[18] Xu W;Bosman G.Space charge limited current noise in AlGaN/GaN HEMTs[A].,2013
[19] Xu W;Rao H;Bosman G.Evidence of space charge limited flow in the gate current of AlGaN/GaN high electron mobility transistors[J].Applied Physics Letters,2012100:223504.
[20] Sudharsanan S;Karmalkar S.Modeling of the reverse gate leakage in AlGaN/GaN high electron mobility transistors[J].Journal of Applied Physics,2010107:064501.
[21] Crupi F;Magnone P;Simoen E.The role of the interfaces in the 1/f noise of MOSFETs with high-k gate stacks[J].ECS Transactions,200919(02):87.
[22] Hasegawa H;Akazawa M.Current transport,Fermi level pinning,and transient behavior of group-Ⅲ nitride Schottky barriers[J].Journalof the Korean Physical Society,200955(03):1167.
[23] Vitusevich S A;Danylyuk S V;Kurakin A M.Origin of noise in AlGaN/GaN heterostructures in the range of 10-100 MHz[J].Journal of Applied Physics,200699:0737061.
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