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[1] Konstantin K. Likharev.Single-electron devices and their applications[J].Proceedings of the IEEE,19994(4):606-632.
[2] 刘明;陈宝钦;谢常青;王丛舜;龙世兵;徐秋霞;李志钢;易里成荣;涂德钰;商立伟.纳米电子器件及其集成[J].半导体学报,2006(z1):7-10.
[3] 韩伟华;汤圆美树;葛西诚也.GaAs基单电子晶体管低温探测THz光子的研究[J].半导体学报,2007(4):500-506.
[4] Gonzalez-Zalba, M. F.;Barraud, S.;Ferguson, A. J.;Betz, A. C..Probing the limits of gate-based charge sensing[J].Nature Communications,2015Jan.(Jan.)
[5] Brenning H;Kafanov S;Duty T;Kubatkin S;Delsing P.An ultrasensitive radio-frequency single-electron transistor working up to 4.2 K[J].Journal of Applied Physics,200611(11):14321-1-14321-4-0.
[6] Lu W.;Ji ZQ.;Pfeiffer L.;West KW.;Rimberg AJ..Real-time detection of electron tunnelling in a quantum dot[J].Nature,20036938(6938):422-425.
[7] Aassime A.;Wendin G.;Schoelkopf RJ.;Delsing P.;Johansson G..Radio-frequency single-electron transistor as readout device for qubits: Charge sensitivity and backaction[J].Physical review letters,200115(15):3376-3379.
[8] Brenning HTA;Kubatkin SE;Erts D;Kafanov SG;Bauch T;Delsing P.A single electron transistor on an atomic force microscope probe[J].Nano letters,20065(5):937-941.
[9] Weber J;Weis J;Hauser M;Von Klitzing K.Fabrication of an array of single-electron transistors for a scanning probe microscope sensor[J].Nanotechnology,200837(37):375301-1-375301-4-0.
[10] Kaspar Suter;Terunobu Akiyama;Nicolaas F. de Rooij;Magdalena Huefner;Thomas Ihn;Urs Staufer.Integration of a Fabrication Process for an Aluminum Single-Electron Transistor and a Scanning Force Probe for Tuning-Fork-Based Probe Microscopy[J].Journal of Microelectromechanical Systems: A Joint IEEE and ASME Publication on Microstructures, Microactuators, Microsensors, and Microsystems,20105(5):1088-1097.
[11] Koppinen, P. J.;Stewart, M. D.;Zimmerman, N. M..Fabrication and Electrical Characterization of Fully CMOS-Compatible Si Single-Electron Devices[J].IEEE Transactions on Electron Devices,20131(1):78-83.
[12] Zimmerman NM;Simonds BJ;Fujiwara A;Ono Y;Takahashi Y;Inokawa H.Charge offset stability in tunable-barrier Si single-electron tunneling devices[J].Applied physics letters,20073(3):33507-1-33507-3-0.
[13] Takahashi Y.;Namatsu H..Size dependence of the characteristics of Si single-electron transistors on SIMOX substrates[J].IEEE Transactions on Electron Devices,19968(8):1213-1217.
[14] K.Uchida;J.Koga.Silicon single-electron tunneling device interfaced with a CMOS inverter[J].Nanotechnology,19992(2):198-200.
[15] Manoharan M;Tsuchiya Y;Oda S;Mizuta H.Silicon-on-Insulator-Based Radio Frequency Single-Electron Transistors Operating at Temperatures above 4.2 K[J].Nano letters,200812(12):4648-4652.
[16] SU Li-Na;LV Li;LI Xin-Xing;QIN Hua;GU Xiao-Feng.Fabrication and Characterization of a Single Electron Transistor Based on a Silicon-on-Insulator[J].中国物理快报(英文版),2015(4):94-96.
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