综合运用动电位电化学阻抗谱(DEIS)和时间扫描模式下的电化学阻抗谱(TSEIS)研究了304不锈钢在3.5％(质量分数)NaCl溶液中的点蚀行为.DEIS的结果表明,在比点蚀电位0.15V负得多的电位0.02V下,亚稳态点蚀就已经开始,并且亚稳态蚀孔的产生与再钝化是随机的,DEIS测试得到的稳态点蚀电位比动电位极化法得到的点蚀破裂电位要负0.05V.TSEIS的结果表明,只有在钝化膜减薄到一定程度后,点蚀的形核才能发生.通过对等效电路中元件参数的分析,揭示了点蚀发展过程中双电层和钝化膜结构的变化特点.
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