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采用多靶反应磁控溅射技术制备一系列不同Ti含量的W-Ti-N复合膜.采用X射线衍射仪、扫描电镜、纳米压痕仪等检测方法对薄膜的微结构和力学性能进行表征.采用UMT-2功能摩擦试验机,在室温、大气环境、无润滑的条件下对W-Ti-N复合膜的摩擦性能进行评价,同时,探讨薄膜的致硬机理和摩擦机制.结果表明:Ti含量(原子分数,下同)为5%~23.48%时,薄膜硬度处于峰值区,硬度值最高可达39GPa,摩擦因数在0.4左右.当Ti含量高于23.48%时,硬度随着Ti含量增加而下降,摩擦因数随Ti含量的增加而升高.

参考文献

[1] HU J C;CHANG T C .Characterization of multilayered Ti/TiN films grown by chemical vapor deposition[J].THIN SOLID FILMS,1998,332(1-2):423427.
[2] Arias DF;Arango YC;Devia A .Characterization of bilayer coatings of TiN/ZrN grown using pulsed arc PAPVD[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2005(4):1175-1181.
[3] HUANG J H;YANG H C;GUO X J et al.Preparation and characterization of ZrNx film deposition using the pulsed reactive magnetron sputtering[J].Surface and Coatings Technology,2005,195:204-213.
[4] 孔明,赵文济,乌晓燕,魏仑,李戈扬.TiN/Si3N4纳米晶复合膜的微结构和强化机制[J].无机材料学报,2007(03):539-544.
[5] E. Kelesoglu;C. Mitterer;M. K. Kazmanli;M. Urgen .Microstructure and properties of nitride and diboride hard coatings deposited under intense mild-energy ion bombardment[J].Surface & Coatings Technology,1999(0):133-140.
[6] Wu D;Zhang Z;Fu W;Fan X;Guo H .Structure, electrical and chemical properties of zirconium nitride films deposited by dc reactive magnetron sputtering[J].Applied physics, A. Materials science & processing,1997(6):593-595.
[7] SUE J A;CHANG T P .Friction and wear behavior of titanium nitride,zirconium nitride and chromium nitride coatings at elevated temperature[J].Surface and Coatings Technology,1995,76-77:61-69.
[8] SAKAMOTO I;MARUNO S;JIN P .Preparation and microstructure of reactively sputtered Ti1-xZrxN film[J].THIN SOLID FILMS,1993,228:169-179.
[9] MEI F H;DONG Y S;LI Y R et al.Microstructure and mechanical properties of (Ti,A1)(O,N) films synthesized by reactive sputtering[J].Materials Letters,2006,60:375-378.
[10] Ning Jiang;Y.G. Shen;H.J. Zhang .Superhard nanocomposite Ti-Al-Si-N films deposited by reactive unbalanced magnetron sputtering[J].Materials Science & Engineering, B. Solid-State Materials for Advanced Technology,2006(1):1-9.
[11] MATTHES B;BROSZEIT E;KLOOS K H .Tribological behavior and corrosion performance of Ti-B-N hard coatings under plastic manufacturing conditions[J].Surface and Coatings Technology,1993,57(2-3):97-104.
[12] 农尚斌,喻利花,许俊华.Ti-Si-N复合膜的微结构及性能研究[J].表面技术,2008(02):45-49.
[13] 董松涛,喻利花,董师润,许俊华.磁控共溅射制备锆-硅-氮复合薄膜的显微组织与性能[J].机械工程材料,2008(09):54-58.
[14] Yu Benhai;Wang Chunlei;Song Xuanyu .Structural stability and mechanical property of WN from first-principles calculations[J].Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics,2009(1/2):556-559.
[15] Ospina R;Castillo HA;Benavides V;Restrepo E;Arango YC;Arias DF;Devia A .Influence of the annealing temperature on a crystal phase of W/WC bilayers grown by pulsed arc discharge[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2006(3):373-377.
[16] UEKUBO M;OKU T;NII K et al.WNx diffusion barriers between Si and Cu[J].THIN SOLID FILMS,1996,286(1-2):170-175.
[17] 王明霞;肖楠;李德军 .薄膜的合成及其结构和性能的研究[J].功能材料,2008,39(增刊):391-393.
[18] RAMAROTAFIKA H;LEMERIERE G .Influence of a d.c.substrate bias on the resistivity,composition,crystallites size and microstrain of WTi and WTiN films[J].Thin Solld Films,1995,266(02):267-273.
[19] Cavaleiro A.;Trindade B.;Vieira MT. .Influence of Ti addition on the properties of W-Ti-C/N sputtered films[J].Surface & Coatings Technology,2003(0):68-75.
[20] 喻利花,薛安俊,董松涛,许俊华.Si含量对Ti-Al-Si-N薄膜微结构与力学性能的影响[J].材料热处理学报,2010(07):140-145.
[21] 汪蕾,董师润,尤建飞,喻利花,李学梅,许俊华.Ti(C,N)复合膜和TiN/Ti(C,N)多层膜组织和显微硬度[J].材料热处理学报,2010(02):113-118.
[22] Bull SJ.;Bhat DG.;Staia MH. .Properties and performance of commercial TiCN coatings. Part 2: tribological performance[J].Surface & Coatings Technology,2003(0):507-514.
[23] C. Louro;A. Cavaleiro .Hardness versus structure in W-Si-N sputtered coatings[J].Surface & Coatings Technology,1999(0):74-80.
[24] 徐哲,席慧智,阮霞.磁控溅射TiN薄膜工艺参数对显微硬度的影响[J].应用科技,2007(05):1-3,15.
[25] POLCAR T;PARREIRA N M G;CAVALEIRO A .Trihological characterization of tungsten nitride coatings deposited by reactive magnetron sputtering[J].WEAR,2007,262(5 6):655-665.
[26] Junhu Meng;Jinjun Lu;Jingbo Wang;Shengrong Yang .Tribological behavior of TiCN-based cermets at elevated temperatures[J].Materials Science & Engineering, A. Structural Materials: Properties, Misrostructure and Processing,2006(1/2):68-76.
[27] Silva, PN;Dias, JP;Cavaleiro, A .Tribological behaviour of W-Ti-N sputtered thin films[J].Surface & Coatings Technology,2005(1/4):186-191.
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