采用磁控溅射法制备PbSe薄膜,并用配制的腐蚀液进行不同时间的表面处理,从而得到不同表面形貌的薄膜结构.利用扫描电子显微镜(SEM)、X射线衍射仪(XRD)和紫外-可见分光光度计(UV-Vis)对处理后的PbSe薄膜的表面形貌、晶体结构以及光学性能进行了表征,同时对薄膜的光电导性能进行测试.结果表明,薄膜经此工艺处理后,表面形成了一系列纳米陷光结构,并有着不同程度的氧化.不同腐蚀时间下,薄膜的光电导性能均有明显地提升,其中经3h腐蚀处理的薄膜的光电导性能提升最高.该方法无需进行后续热处理,是一种简单高效的敏化手段.
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