离子束改性技术在先进陶瓷材料方面的应用效果突出.在阐述离子束改性原理的基础上,综述了该技术在先进陶瓷薄膜材料微观结构与组织,力学性能和摩擦学性能方面的应用.离子束改性是一种高能高效的掺杂改性手段,在辅助制备高质量薄膜、改善薄膜力学和摩擦力学方面有着显著的优势.深入了解离子束与薄膜原子的作用机制,精确调配薄膜的微观结构和组成,降低成膜质量的不确定性,是未来离子束改性先进陶瓷薄膜的研究重点.
参考文献
[1] | 周元康;孙丽华;李晔.陶瓷表面技术[M].北京:国防工业出版社,2007 |
[2] | 彭志坚,苗赫濯,王成彪,傅志强,李文治.MEVVA源离子注入陶瓷刀具表面改性研究[J].稀有金属材料与工程,2008(z1):442-445. |
[3] | 冯建基,李国卿,张长瑞,牟宗信,齐民,刘洪泽,周新贵.铝离子注入Si3N4陶瓷的抗氧化性能[J].硅酸盐学报,2004(09):1060-1063. |
[4] | Annealing effect on the structural, mechanical and electrical properties of titanium-doped diamond-like carbon films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2009(5):1503. |
[5] | H. W. Zheng;Y. L. Yan;Z. C. Lv;S. W. Yang;X. G. Li;J. D. Liu;B. J. Ye;C. X. Peng;C. L. Diao;W. F. Zhang .Room-temperature ferromagnetism in Cu-implanted 6H-SiC single crystal[J].Applied physics letters,2013(14):142409-1-142409-4. |
[6] | Y.H.Xue;X.D.Zhang;X.L.Zhang;Y.Y. Shen;F.Zhu;LH.Zhang;J. Wang;C.L.Liu .Room temperature magnetic properties of Fe and C implanted ZnO films[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2011(24):10329-10332. |
[7] | Lv Z C;Ma X P;Zheng H W et al.Room temperature ferromagnetism induced by N-ion implantation in 6H-SiC single crystal[J].Materials Letters,2013,93:374. |
[8] | Hayashia N;Sakamoto I;Moriwakic T et al.Synthesis of iron and copper nano-clusters in SiO2 by ion implantation and the magnetic properties[J].Journal of Magnetism and Magnetic Materials,2005,290:98. |
[9] | Shah, A.;Mahmood, A. .Effect of Cr implantation on structural and optical properties of AlN thin films[J].Physica, B. Condensed Matter,2012(19):3987-3991. |
[10] | Bregolin, F.L.;Behar, M.;Sias, U.S.;Moreira, E.C. .Structural and photoluminescence properties of Si nanoclusters obtained by ion implantation into Si_3N_4 films[J].Journal of Luminescence: An Interdisciplinary Journal of Research on Excited State Processes in Condensed Matter,2011(11):2377-2381. |
[11] | 刘桂玲,黄政仁,刘学建,董绍明,江东亮.碳化硅表面改性和光学镜面加工的研究现状[J].无机材料学报,2007(05):769-774. |
[12] | Morijiri K;Endo H;Morikaawa K et al.0.5 keV Xe+ ion beam nano smoothing of ULE (R) substrate after processing with 3.0-10.0 keV Xe+ ion beam[J].Microelectronic Engineering,2011,88(08):2694. |
[13] | Baba, K.;Hatada, R.;Flege, S.;Ensinger, W.;Shibata, Y.;Nakashima, J.;Sawase, T.;Morimura, T..Preparation and antibacterial properties of Ag-containing diamond-like carbon films prepared by a combination of magnetron sputtering and plasma source ion implantation (Conference Paper)[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2013:179-184. |
[14] | 王进,Sunny C.H.Kwok,陈俊英,杨萍,黄楠,P.K.Chu.磷掺杂类金刚石薄膜的制备与性能研究[J].真空科学与技术学报,2005(02):123-126. |
[15] | Agarwal G;Sharma P;Jain IP .SHI induced silicide formation and surface morphology at Co/Si system[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2006(3):1165-1169. |
[16] | Chen DH.;Wong SP.;Yang SH.;Mo D. .Composition, structure and optical properties of SiC buried layer formed by high dose carbon implantation into Si using metal vapor vacuum arc ion source[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2003(1/2):1-7. |
[17] | Poudel P R;Poudel P P;Sharma B P et al.Synthesis of buried layers of β-SiC in Si by multiple energy carbon ion implantations and post thermal annealing[J].THIN SOLID FILMS,2012,524:35. |
[18] | Poudel P R;Rout B;Hossain K M et al.Formation and characterization of ion beam assisted nanosystems in silicon[J].REVISTA MEXICANA DE FISICA,2010,56(04):297. |
[19] | 张通和;吴瑜光.离子束表面工程技术与应用[M].北京:机械工业出版社,2005 |
[20] | Lindner J K N .High dose carbon implantations into silicon fundamental studies for new technological tricks[J].Applied Physics A(Materials Science and Processing),2003,77:27. |
[21] | Valcueva E;Manova D;Mandl S;Alexandrova S;Lutz J;Dimitrov S .Ion beam synthesis of AlN nanostructured thin films[J].Journal of optoelectronics and advanced materials,2007(1):166-169. |
[22] | Hopf, T.;Schuette, F.;Leveneur, J.;Kennedy, J.;Markwitz, A. .Ion-beam synthesis of 3C-SiC surface layers on silicon[J].Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films,2012(4):399-404. |
[23] | C. M. Sun;H. K. Tsang;S. P. Wong;W. Y. Cheung;N. Ke;S. K. Hark .Rapid thermal annealing of ion beam synthesized beta-FeSi_(2) nanoparticles in Si[J].Applied physics letters,2008(21):211902-1-211902-3-0. |
[24] | Khamsuwan, J.;Intarasiri, S.;Kirkby, K.;Chu, P.K.;Singkarat, S.;Yu, L.D..Ion-beam synthesis and photoluminescence of SiC nanocrystals assisted by MeV-heavy-ion-beam annealing[J].Nuclear Instruments and Methods in Physics Research, Section B. Beam Interactions with Materials and Atoms,2012:88-91. |
[25] | Y.S. Katharria;Sandeep Kumar;D. Kanjilal .Influence of SHI irradiation on the formation of buried SiC[J].Nuclear Instruments and Methods in Physics Research, Section B. Beam Interactions with Materials and Atoms,2007(2):563-566. |
[26] | Takayuki Tokoroyama;Makoto Kamiya;Noritsugu Umehara;Chao Wang;Dongfeng Diao .Influence of UV irradiation in low frictional performance of CN_x coatings[J].Lubrication Science,2012(3):129-139. |
[27] | Sun R;Xu T;Xue QJ .Surface modification of single crystal silicon by Ar+ ion implantation and vacuum deposition of amorphous carbon coating[J].Surface & Coatings Technology,2006(20/21):5794-5799. |
[28] | Li GB;Zhang JZ;Meng QL;Li WZ .Synthesis of silicon carbide films by combined implantation with sputtering techniques[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2007(20):8428-8434. |
[29] | F. C. Tai;S. C. Lee;C. H. Wei .Correlation between I_D/I_G Ratio from Visible Raman Spectra and sp~2/sp~3 Ratio from XPS Spectra of Annealed Hydrogenated DLC Film[J].Materials transactions,2006(7):1847-1852. |
[30] | Robertson J. .Diamond-like amorphous carbon [Review][J].Materials Science & Engineering, R. Reports: A Review Journal,2002(4/6):129-281. |
[31] | Qin LZ;Wu ZL;Zhang X;Liu AD;Liao B;Deng J .Modification of DLC films by Ni+ ions implantation[J].Nuclear Instruments and Methods in Physics Research, Section B. Beam Interactions with Materials and Atoms,2008(18):3939-3944. |
[32] | Ding WC;Hu D;Zheng J;Chen P;Cheng BW;Yu JZ;Wang QM .Strong visible and infrared photoluminescence from Er-implanted silicon nitride films[J].Journal of Physics, D. Applied Physics: A Europhysics Journal,2008(13):135101-1-135101-4-0. |
[33] | W.M. de Azevedo;E.F. da Silva Jr.;E.A. de Vasconcelos;H. Boudinov .Visible photoluminescence from Ge nanoclusters implanted in nanoporous aluminum oxide films[J].Microelectronics journal,2005(11):992-994. |
[34] | Spiga S.;Fanciulli M.;Ferretti N.;Boscherini F.;d'Acapito F.;Ciatto G.;Schmidt B. .Formation and structure of Sn and Sb nanoclusters in thin SiO2 films[J].Nuclear Instruments and Methods in Physics Research, Section B. Beam Interactions with Materials and Atoms,2003(0):171-177. |
[35] | E.S. Marstein;A.E. Gunnaes;U. Serincan;S. Jorgensen;A. Olsen;R. Turan;T.G. Finstad .Mechanisms of void formation in Ge implanted SiO_2 films[J].Nuclear Instruments and Methods in Physics Research, Section B. Beam Interactions with Materials and Atoms,2003(4):424-433. |
[36] | Buntov, E.A.;Zatsepin, A.F.;Kortov, V.S.;Pustovarov, V.A.;Fitting, H.-J. .Electronic and vibrational states of oxygen and sulfur molecular ions inside implanted SiO_2 films[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2011(8/9):1977-1980. |
[37] | Wang DY.;Chiu MC. .Characterization of TiN coatings post-treated by metal-plasma ion implantation process[J].Surface & Coatings Technology,2002(1/3):201-207. |
[38] | Purushotham K P;Ward L P;Brack N et al.Tribological studies of Zr-implanted PVD TiN coatings deposited on stainless steel substrates[J].WEAR,2003,254(7-8):589. |
[39] | Deng B;Tao Y;Hu Z .The microstructure,mechanical and tribologieal properties of TiN coatings after Nb and C ion implantation[J].Applied Surface Sinence,2013,284:405. |
[40] | Tatsuhiko Aizawa;Atsushi Mitsuo;Thananan Akhadejdamrong .Chemical Modification of Titanium Nitride Films via Ion Implantation[J].Materials transactions,2003(10):1962-1970. |
[41] | M. Zielinski;A. Leycuras;S. Ndiaye;T. Chassagne .Stress relaxation during the growth of 3C-SiC/Si thin films[J].Applied physics letters,2006(13):131906-1-131906-3-0. |
[42] | Zielinski M;Ndiaye S;Chassagne T;Juillaguet S;Lewandowska R;Portail M;Leycuras A;Camassel J .Strain and wafer curvature of 3C-SiC films on silicon: influence of the growth conditions[J].Physica Status Solidi, A. Applied Research,2007(4):981-986. |
[43] | Zhang X;Wu Z L;Wu X Y et al.Structure and properties of tetrahedral amorphous carbon films implanted with Ti ion[J].Surface and Coatings Technology,2007,201(9-11):5219. |
[44] | PalDey S.;Deevi SC. .Single layer and multilayer wear resistant coatings of (Ti,Al)N: a review [Review][J].Materials Science & Engineering, A. Structural Materials: Properties, Misrostructure and Processing,2003(1/2):58-79. |
[45] | Ahlgren, M;Blomqvist, H .Influence of bias variation on residual stress and texture in TiAIN PVD coatings[J].Surface & Coatings Technology,2005(1/4):157-160. |
[46] | 韩亮,宁涛,刘德连,何亮.氩离子轰击对四面体非晶碳膜内应力和摩擦系数影响的研究[J].物理学报,2012(17):410-416. |
[47] | Zhang X;Liang H;Wu Z L et al.The effect of substrate bias on titanium carbide/amorphous carbon nanocomposite films deposited by filtered cathodic vacuum arc[J].Nuclear Instruments Methods Phys Res Section B,2013,307:115. |
[48] | Manlin Tan;Jiaqi Zhu;Jiecai Han;Xiao Han;Li Niu;Wangshou Chen .Stress evolution of tetrahedral amorphous carbon upon boron incorporation[J].Scripta materialia,2007(2):141-144. |
[49] | Sun R;Xu T;Zhang JW;Xue QJ .The study of ion mixed amorphous carbon films on single crystal silicon by C ion implantation[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2006(12):4236-4243. |
[50] | Bharathy P V;Yang Q;Kiran M et al.Reactive biased target ion beam deposited W-DLC nanocomposite thin films-Microstructure and its mechanical properties[J].Diamond and Related Materials,2012,23:34. |
[51] | Yang Y Y;Peng Z J;Fu Z Q et al.Study on W graded doping DLC composite fims with multicomponent transtion layer[J].Acta Metall Sinica,2010,46(01):34. |
[52] | Liu C;Gou W;Li G Q et al.Improvement of mechanical properties of diamond-like carbon film by Ti ion implantation[J].Plasma Processes and Polymers,2007,4:S265. |
[53] | Chang YY.;Wang DY.;Wu WT. .Tribological enhancement of CrN coatings by niobium and carbon ion implantation[J].Surface & Coatings Technology,2004(0):441-446. |
[54] | Ivashchenko VI;Dub SN;Porada OK;Ivashchenko LA;Skrynskyy PL;Stegniy AI .Mechanical properties of PECVD a-SiC : H thin films prepared from methyltrichlorosilane[J].Surface & Coatings Technology,2006(22/23):6533-6537. |
[55] | Yoshitake M.;Thananan A.;Aizawaki T.;Yoshihara K. .Micro-XPS analysis of slide-tested TiN films with/without Cl+ implantation[J].Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films,2002(1):698-702. |
[56] | Bin Deng;Ye Tao;Deliang Guo .Effects of vanadium ion implantation on microstructure, mechanical and tribological properties of TiN coatings[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2012(22):9080-9086. |
[57] | Tian B;Yue W;Fu Z Q et al.Surface properties of Moimplanted PVD TiN coatings using MEWA source[J].Applied Surface Sinence,2013,280:482. |
[58] | Zhu Y C;Fujita K;Iwamoto N et al.Influence of boron ion implantation on the wear resistance of TiAlN coatings[J].Surface and Coatings Technology,2002,158:664. |
[59] | 刘星,马国佳,孙刚,段玉平,刘顺华.不同工艺对TaN薄膜摩擦磨损性能影响研究[J].稀有金属材料与工程,2010(z1):212-215. |
[60] | Cheng, G.-A.;Han, D.-Y.;Liang, C.-L.;Wu, X.-L.;Zheng, R.-T. .Influence of residual stress on mechanical properties of TiAlN thin films[J].Surface & Coatings Technology,2013(Suppl.1):S328-S330. |
[61] | Ko-Wei Weng;Chi-Lung Chang;Da-Yung Wang .Effect of ion energy on degradation of diamond-like carbon films exposed to high-energy bombardment from an ion implanter[J].Diamond and Related Materials,2002(7):1447-1453. |
[62] | 韩亮,陈仙,杨立,王炎武,王晓艳,赵玉清.高能氮离子轰击对四面体非晶碳膜的表面改性和摩擦系数影响的研究[J].物理学报,2011(06):584-588. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%