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以铜作为基底的化学气相沉积法(CVD)是目前制备石墨烯的重要方法和手段.简单介绍了石墨烯的几种主要制备方法,突出化学气相沉积法能够有效制备出大规模可控高质量的石墨烯,并阐述了铜基底上化学气相沉积石墨烯的生长机理,主要从基底材料、不同的工艺条件以及石墨烯转移技术出发评述了化学气相沉积法制备石墨烯的研究进展,指出由铜网基底材料替代铜箔基底的良好应用前景,最后展望了铜基底化学气相沉积石墨烯的发展方向.

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