欢迎登录材料期刊网

材料期刊网

高级检索

采用磁控溅射法在石英衬底上制备了 MgO 薄膜并分别在不同温度下进行退火处理。利用 X 射线衍射仪(XRD)和扫描电子显微镜(SEM)研究了 MgO 薄膜的结构和表面形貌随退火温度的变化,发现退火可以改善薄膜的结晶质量,即随着退火温度的升高,晶粒尺寸逐渐增大,结晶性能更佳,表面更加平整。此外,通过紫外-可见光分光光度计研究了 MgO 薄膜光学特性的变化,发现随着薄膜退火温度的升高,可见光透射率下降,光学带隙值逐渐减小。

MgO thin films with (200)orientation were prepared by magnetron sputtering on the quartz sub-strates and were annealed at different temperatures.The structure and surface morphology were studied by X-ray dif-fraction (XRD)and scanning electron microscopy (SEM).The results showed that annealing can improve the crystal-line quality of the film.As the annealing temperature increased,the grain size increased,the crystallization properties became better,and the surface became more smooth.The optical properties were also studied by using UV visible spectrophotometer.The results showed that with the film annealing temperature increasing,the visible light transmit-tance decreased gradually,together with the optical band gap value decreased.

参考文献

[1] Epitaxial colossal magnetoresistive La_(0.67)(Sr,Ca)_(0.33)MnO_(3) films on Si[J].Applied physics letters,200324(24):4295-4297.
[2] Souichirou HIDAKA;Manabu ISHIMOTO;Nobuhiro IWASE.Influence of Film Characteristics on the Sputtering Rate of MgO[J].IEICE transactions on electronics,199910(10):1804-1807.
[3] Kunio YOSHIDA;Heiju UCHIIKE;Masahiro SAWA.Fundamental Characteristics of MgO Film and Their Influence on the Operation of Plasma Displays[J].IEICE transactions on electronics,199910(10):1798-1803.
[4] Nam KH;Jung MJ;Han JG;Kopte T;Hartung U;Peters C.Synthesis of high-density MgO sputtering films by a novel magnetron system[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,20041(1):1-6.
[5] 喻志农;薛唯;郑德修;孙鉴.退火处理对等离子体显示器中氧化镁薄膜特性的影响[J].北京理工大学学报,2006(1):63-67.
[6] S.C. Chen;T.Y.Kuo.(200)-Texture and microstructure of MgO films by rf-magnetron sputtering in Ar plus N_2 atmosphere[J].Materials & design,20104(4):1700-1705.
[7] Cheng YH.;Kupfer H.;Krause U.;Kopte T.;Peters C.;Richter F..Influence of O-2 flow rate on the structural properties of MgO films deposited by dual magnetron sputtering[J].Surface & Coatings Technology,20040(0):784-788.
[8] Srinivasan, P.;Spearing, S. M..Effect of Heat Transfer on Materials Selection for Bimaterial Electrothermal Actuators[J].Journal of Microelectromechanical Systems,20083(3):653-667.
[9] Yu ZN.;Seo JW.;Zheng DX.;Sun J..Structural and discharging properties of MgO thin films prepared by ion beam-assisted deposition[J].Surface & Coatings Technology,20030(0):398-404.
[10] M. Bender;W. Seelig;C. Daube;H. Frankenberger;B. Ocker;J. Stollenwerk.Dependence of oxygen flow on optical and electrical properties of DC-magnetron sputtered ITO films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,19981/2(1/2):72-77.
[11] Kim H.;Horwitz JS.;Murata H.;Kafafi ZH.;Gilmore CM.;Chrisey DB.;Pique A..Effect of aluminum doping on zinc oxide thin films grown by pulsed laser deposition for organic light-emitting devices[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,20000(0):798-802.
[12] Jim-Liang Zhao;Xiao-Min Li;Ji-Ming Bian;Wei-Dong Yu;Xiang-Dong Gao.Structural, optical and electrical properties of ZnO films grown by pulsed laser deposition (PLD)[J].Journal of Crystal Growth,20053/4(3/4):507-512.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%