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采用密度泛函理论研究了空位和反位缺陷效应对四元Heusler合金CoFeTiSb电子结构的影响.结果表明,VdCo、VdFe空位缺陷和Tisb反位缺陷具有负的形成能,能保持85%以上的自旋极化率,在CoFeTiSb合金工业制备过程中自发形成几率较大;VdTi、VdSo空位缺陷和FeCo反位缺陷虽然费米面处自旋极化率为100%,仍保持半金属性,但正的形成能表明在制备过程中它们出现的几率较小.此外,SbCo、SbFe、SbTi、CoTi、FeTi反位缺陷由于具有较大的形成能和半金属性破坏,自旋极化率不同程度降低.

参考文献

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