原子层沉积技术(ALD)是一项正处于发展之中、在许多领域具有巨大应用前景的新型材料制备技术，该技术在纳米结构和纳米复合结构的制备方面显示出独特的优势，在新型薄膜太阳能电池领域呈现出巨大的发展潜力和前景。首先概述了 ALD技术的工作原理，简要介绍了近几年 ALD技术在硅基太阳能电池和铜铟镓硒薄膜电池(CIGS)中的应用，然后重点综述了原子层沉积纳米功能薄膜在染料敏化太阳能电池(DSSCs)和有机-无机杂化钙钛矿太阳能电池(PSCs)为代表的新型薄膜太阳能电池中的应用。最后，总结了原子层沉积功能薄膜的特点和优势，展望了 ALD在新能源材料与器件领域的应用前景和发展趋势。
Atomic layer deposition (ALD),as an important and developing process for the fabrication of novel structures,demonstrates peculiar advantages in the preparation of nanostructures and composite nanostructures,and promises great potential and prospects in new thin-film solar cells.In the review,the applications of ALD technology in silicon-based solar cells and copper indium gallium selenide (CIGS)type film solar cells are briefly introduced after describing the working principle of ALD,and then the utilization of ALD-fabricated functional nanofilms in new thin-film solar cells represented by dye-sensitized solar cells (DSSCs)and perovskite solar cells (PSCs)is empathetically elaborated.At last,the characteristics and advantages of functional nanofilms fabricated by ALD technology are sum-marized,and the application potential and tendency of ALD technology in new energy material and devices are prospected.
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