为了研究沉积温度对涂层微结构与力学性能的影响,采用直流磁控溅射技术制备了CrB2涂层.通过XPS、XRD、SPM、SEM、HRTEM、纳米压痕仪和维氏压痕仪分别分析了涂层的成分、结构、微观形貌和力学性能.结果表明:在不同沉积温度下,CrB2涂层均由CrB2和少量Cr相组成.涂层具有致密的纳米柱状结构,其直径大约为7 nm,且沿着生长方向贯穿整个涂层截面.随沉积温度升高,涂层晶体取向由(101)和(001)的混合取向逐渐转变为(001)择优取向,涂层由纤维状结构转变为柱状晶结构,且柱状晶尺寸随沉积温度的增加逐渐细化,致密化程度增加.涂层的力学性能随沉积温度的升高而显著增加;当沉积温度达到400℃时,涂层具有最高硬度(50.7±2)GPa和最高弹性模量(513.6±10) GPa.微观结构和力学性能随沉积温度的演变归因于沉积原子运动的逐渐增强和结构的致密化.
参考文献
| [1] | A.L. Ivanovskii.Mechanical and electronic properties of diborides of transition 3d-5d metals from first principles: Toward search of novel ultra-incompressible and superhard materials[J].Progress in materials science,20121(1):184-228. |
| [2] | X.L. Cui;Y.Y. Wu;T. Gao;X.F. Liu.Influence of preparation temperature on morphology evolution and growth mechanism of CrB_2 in Al-Cr-B alloys[J].Materials Letters,2014Mar.1(Mar.1):176-179. |
| [3] | Nedfors, Nils;Primetzhofer, Daniel;Wang, Liping;Lu, Jun;Hultman, Lars;Jansson, Ulf.Characterization of magnetron sputtered Cr-B and Cr-B-C thin films for electrical contact applications[J].Surface & Coatings Technology,2015:167-176. |
| [4] | K. L. Dahm;L. R. Jordan;J. Haase;P. A. Dearnley.Magnetron sputter deposition of chromium diboride coatings[J].Surface & Coatings Technology,19981/3(1/3):413-418. |
| [5] | Audronis M;Kelly PJ;Arnell RD;Leyland A;Matthews A.The structure and properties of chromium diboride coatings deposited by pulsed magnetron sputtering of powder targets[J].Surface & Coatings Technology,20055/6(5/6):1366-1371. |
| [6] | Choi HS;Park B;Lee JJ.CrB2 coatings deposited by inductively coupled plasma assisted DC magnetron sputtering[J].Surface & Coatings Technology,20074/7(4/7):982-986. |
| [7] | Pelleg J;Sade G;Sinder M;Mogilyanski D.Compositional and structural changes in TiB2 films induced by bias, in situ and post-deposition annealing, respectively[J].Physica, B. Condensed Matter,20061/2(1/2):118-127. |
| [8] | Yuya Kajikawa;Suguru Noda;Hiroshi Komiyama.Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,20036(6):1943-1954. |
| [9] | Zhang, Teng Fei;Gan, Bin;Park, Seong-mo;Wang, Qi Min;Kim, Kwang Ho.Influence of negative bias voltage and deposition temperature on microstructure and properties of superhard TiB2 coatings deposited by high power impulse magnetron sputtering[J].Surface & Coatings Technology,2014:115-122. |
| [10] | Mayrhofer PH;Mitterer C;Wen JG;Greene JE;Petrov I.Self-organized nanocolumnar structure in superhard TiB2 thin films[J].Applied physics letters,200513(13):1909-1-1909-3-0. |
| [11] | P. B. Barna;M. Adamik.Fundamental structure forming phenomena of polycrystalline films and the structure zone models[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,19981/2(1/2):27-33. |
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