二氧化铈因具有高介电常数、折射率和紫外吸收率而在光学和电子器件方面得到广泛应用.在500℃沉积温度下,采用真空热蒸镀法在单晶Si基体上制备纳米CeO2光学薄膜,用扫描电子显微镜(SEM),X射线衍射仪(XRD)对CeO2薄膜的表面形貌和结构进行了表征和分析.结果表明薄膜呈现多晶纳米颗粒,晶粒粒径为20 nm左右,其形貌均匀致密.用台阶法、反射光谱法和椭偏偏振法对不同沉积时间(6～15 min)制备的薄膜厚度进行对比测量研究,不同测量方法所测薄膜厚度一致,并随着薄膜厚度增加,厚度测量的差值越小.运用德鲁德-洛伦茨(Drude-Lorentz)谐振模型对椭偏参量进行拟合,得到了不同厚度CeO2薄膜的光学常数.结果表明在350～ 1000 nm内其折射率(n)与消光系数(k)随着波长的增加而减少,632.8 nm波长下,薄膜折射率在2.11 ～2.20,并且薄膜的折射率随着薄膜厚度的增加而增加,而消光系数k随着薄膜厚度的增加而减少.
参考文献
| [1] | 杨萌萌,屠海令,张心强,熊玉华,王小娜,杜军.CeO2掺杂对HfO2栅介质电学特性的影响[J].稀有金属,2012(02):292-296. |
| [2] | Porqueras I.;Person C.;Corbella C.;Vives M.;Pinyol A.;Bertan E. .Characteristics of e-beam deposited electrochromic CeO2 thin films[J].Solid state ionics,2003(1/4):131-137. |
| [3] | 孙小庆,魏峰,杨志民,陈秋云,陈军.高真空脉冲激光沉积CeO2（111）/Si（111）薄膜的结构与形貌研究[J].稀有金属,2013(03):389-395. |
| [4] | Shi DQ.;Ionescu M.;Silver TM.;Dou SX. .Relationship between epitaxial deposition and growth modes of CeO2 films[J].Physica, C. Superconductivity and its applications,2003(4):475-481. |
| [5] | Berton MAC.;Avellaneda CO.;Bulhoes LOS. .Thin film of CeO2-SiO2: a new ion storage layer for smart windows[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2003(4):443-449. |
| [6] | Xiao WD.;Guo QL.;Wang EG. .Transformation of CeO2(111) to Ce2O3(0001) films[J].Chemical Physics Letters,2003(5-6):527-531. |
| [7] | Structural characterization and optical properties of UO_2 thin films by magnetron sputtering[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2010(10):3047. |
| [8] | 金波,李炜,郑志宏,王曦.电子束蒸发沉积制备高度晶体取向的CeO2薄膜[J].功能材料与器件学报,2004(01):24-28. |
| [9] | 陈秋云,赖新春,白彬,张桂凯,罗丽珠,蒋春丽.UO2薄膜制备和光学常数及厚度测定[J].原子能科学技术,2010(09):1126-1130. |
| [10] | El Rhaleb H.;Benamar E.;Rami M.;Roger JP.;Hakam A.;Ennaoui A. .Spectroscopic ellipsometry studies of index profile of indium tin oxide films prepared by spray pyrolysis[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2002(1/4):138-145. |
| [11] | Losurdo M.;Barreca D.;Capezzuto P.;Bruno G.;Tondello E. .Interrelation between nanostructure and optical properties of oxide thin films by spectroscopic ellipsometry[J].Surface & Coatings Technology,2002(0):2-8. |
| [12] | Kanakaraju S.;Sood AK.;Mohan S. .OPTICAL AND STRUCTURAL PROPERTIES OF REACTIVE ION BEAM SPUTTER DEPOSITED CEO2 FILMS[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1997(1/2):191-195. |
| [13] | 王学华,薛亦渝,赵利,张幼陵.电子束蒸发沉积TiO2薄膜结构及光学性能的研究[J].武汉理工大学学报,2002(11):11-14. |
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