基于溶液工艺和水热处理制备了ZnO薄膜.采用椭圆偏振光谱分析仪,原子力显微镜,X射线衍射仪研究和分析了水热处理温度对薄膜的微观形貌,光学特性,晶体结构的影响.实验结果表明,水热处理温度由110℃升高到130℃,薄膜光学带隙由3.19eV增大到3.31eV,而薄膜表面粗糙度从19.3nm降到12.9nm.然而,当处理温度超过140℃后,与130℃下处理的膜相比质量显著劣化.此外,130℃下水热处理的膜与500℃下高温退火的膜对比表明水热法有相似的光学特性,同时,XRD分析表明水热处理能改善晶体特性.证明了利用水热处理能够极大地降低溶液法制备ZnO薄膜所需的退火温度.
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