随着晶体硅太阳电池技术的不断发展,硅片的厚度不断降低,电池表面钝化对提高太阳能电池转化效率变得尤为重要.本文介绍了表面钝化膜在晶体硅太阳电池中的应用,以及几种晶体硅电池表面钝化方法,包括等离子体增强化学气相沉积法、氢化非晶硅、热氧化法、原子层沉积法以及叠层钝化,并分别介绍了它们在应用上的优缺点.分析了制备钝化膜过程中存在的问题,并提出了相应措施及发展趋势.表面钝化技术是提高晶体硅电池转换效率最有效的手段之一,今后晶体硅电池表面钝化技术仍将是国内和国际研究的热点之一.
参考文献
[1] | Shaoqing Xiao;Shuyan Xu .High-Efficiency Silicon Solar Cells--Materials and Devices Physics[J].Critical Reviews in Solid State and Materials Sciences,2014(4):277-317. |
[2] | Garnett, E;Yang, PD .Light Trapping in Silicon Nanowire Solar Cells[J].Nano letters,2010(3):1082-1087. |
[3] | Aberle A.G.; .Surface Passivation of Crystalline Silicon Solar Cells: A Review[J].Progress in photovoltaics,2000(5):473-487. |
[4] | G. Dingemans;W. M. M. Kessels .Status and prospects of Al_(2)O_(3)-based surface passivation schemes for silicon solar cells[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,2012(4):040802-1-040802-27. |
[5] | Qi Wang;M. R. Page;E. Iwaniczko;Yueqin Xu;L. Roybal;R. Bauer;B. To;H.-C. Yuan;A. Duda;F. Hasoon;Y. F. Yan;D. Levi;D. Meier;Howard M. Branz;T. H. Wang .Efficient heterojunction solar cells on p-type crystal silicon wafers[J].Applied physics letters,2010(1):013507-1-013507-3. |
[6] | 齐晓光,杨瑞霞,雷青松,薛俊明.P型非晶硅薄膜制备及其在HIT太阳电池中应用[J].人工晶体学报,2014(02):280-284. |
[7] | 何悦,窦亚楠,马晓光,陈绍斌,褚君浩.热原子层沉积氧化铝对硅的钝化性能及热稳定性[J].物理学报,2012(24):512-516. |
[8] | High-Efficiency c-Si Solar Cells Passivated With ALD and PECVD Aluminum Oxide[J].IEEE Electron Device Letters,2010(7):695. |
[9] | 赵萍,麻晓园,邹美玲.晶体硅太阳电池减反射膜的研究[J].现代电子技术,2011(12):145-147,151. |
[10] | 陈伟,贾锐,张希清,陈晨,武德起,李昊峰,吴大卫,陈宝钦,刘新宇.晶体硅太阳电池表面钝化技术[J].微纳电子技术,2011(02):118-127. |
[11] | Aberle AG. .Overview on SiN surface passivation of crystalline silicon solar cells[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2001(1/4):239-248. |
[12] | 高华,汪建强,张剑,叶庆好,孟凡英.界面电荷对C-Si表面钝化质量的影响[J].光电技术应用,2011(03):28-34. |
[13] | Duerinckx F.;Szlufcik J. .Defect passivation of industrial multicrystalline solar cells based on PECVD silicon nitride[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2002(1/4):231-246. |
[14] | 席俊华,刘永强,杨凌霞,季振国.外置式电感耦合化学气相沉积法低温制备SiO2薄膜[J].材料科学与工程学报,2013(01):84-87,83. |
[15] | Janthong, B.;Hongsingthong, A.;Krajangsang, T.;Zhang, L.;Sichanugrist, P.;Konagai, M. .Novel a-Si:H/μc-Si:H tandem cell with lower optical loss[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2012(17):2478-2481. |
[16] | Martin A. Green;Keith Emery;Yoshihiro Hishikawa .Solar cell efficiency tables (version 39)[J].Progress in photovoltaics,2012(1):12-20. |
[17] | Ke, W.-C.;Lee, S.-J.;Chen, S.-L.;Shih, C.-H.;Chang, Y.-C..Influence of the molybdenum thickness on the conversion efficiency of thin-film a-Si:H solar cells grown on a 304 stainless steel substrate[J].Surface & Coatings Technology,2013:285-288. |
[18] | 叶发敏,冯仕猛,郭爱娟,熊胜虎.热氧化生长的SiO2钝化膜对晶体硅太阳电池性能的影响[J].太阳能学报,2012(02):270-272. |
[19] | 吴大卫,贾锐,武德起,丁武昌,陈伟,陈晨,岳会会,刘新宇,陈宝钦.氧化铝钝化在晶体硅太阳电池中的应用[J].微纳电子技术,2011(08):528-535. |
[20] | J. Schmidt;A. Merkle;R. Brendel .Surface Passivation of High-efficiency Silicon Solar Cells by Atomic-layer-deposited Al_2O_3[J].Progress in PhotoVoltaics,2008(6):461-466. |
[21] | B. Hoex;S. B. S. Heil;E. Langereis;M. C. M. van de Sanden;W. M. M. Kessels .Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al_(2)O_(3)[J].Applied physics letters,2006(4):042112-1-042112-3-0. |
[22] | 刘志超,卫耀伟,陈松林,马平.ALD氧化铝单层膜1064nm激光损伤特性研究[J].应用光学,2011(02):373-376. |
[23] | N. M. Terlinden;G. Dingemans;V. Vandalon;R. H. E. C. Bosch;W. M. M. Kessels .Influence of the SiO_2 interlayer thickness on the density and polarity of charges in Si/SiO_2/Al_2O_3 stacks as studied by optical second-harmonic generation[J].Journal of Applied Physics,2014(3):033708-1-033708-11. |
[24] | Lee JY;Glunz SW .Investigation of various surface passivation schemes for silicon solar cells[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2006(1):82-92. |
[25] | 郑雪,余学功,杨德仁.α-Si:H/SiNx叠层薄膜对晶体硅太阳电池的钝化[J].物理学报,2013(19):534-538. |
[26] | 李翔,耿会娟,张亚非.晶体硅太阳电池的双层结构钝化膜研究[J].微纳电子技术,2012(08):498-502,556. |
[27] | 柯少颖,王茺,杨宇.SiGe∶H薄膜太阳能电池研究进展[J].材料导报,2014(01):11-16. |
[28] | Vermang, B.;Goverde, H.;Uruena, A.;Lorenz, A.;Cornagliotti, E.;Rothschild, A.;John, J.;Poortmans, J.;Mertens, R..Blistering in ALD Al _2O _3 passivation layers as rear contacting for local Al BSF Si solar cells[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2012:204-209. |
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