以制备出性能优异成本低廉的低辐射镀膜玻璃为目的.通过直流磁控反应溅射技术在玻璃(或单晶硅)表面制备(Al,Ti)N薄膜作为低辐射镀膜玻璃的内层介质层,在此基础上进行单因素变量分析铝靶功率、钛靶功率、氮气流量和溅射时间对薄膜可见光透过率、表面粗糙度的影响以及测定最优条件下薄膜的结晶状态、表面形貌和元素含量.结果表明,当铝靶功率为100W、钛靶功率为80 W、氮气流量为2.5 ml/min、溅射时间为90 min时可见光范围内透过率均在96％以上,表面粗糙度11.3 nm,膜基结合力强,膜质优异适宜低辐射镀膜玻璃功能膜的附着.
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