目的 通过改变极间距来控制膜层在试样表面的局部生长.方法 通过改变阴极面积来营造均匀与非均匀的电场环境.分别进行微弧氧化试验,根据时间-电压曲线、弧光放电现象、膜层厚度分布等,分析了非均匀电场环境下,极间距对6061铝合金微弧诱发和生长过程的影响.结果 非均匀场强下,极间距从2mm增大到50 mm时,终止电压先从550 V降低到450 V,随后又逐渐上升到650 V;微孤诱发时间从10s增加到310s后,又减小到90 s;中心区域膜层厚度从7.5 μm减小到1.5 μm,后又增加到4μm,边缘区域的厚度则从0μm缓慢增加到4μm.微弧氧化在较小极间距的情况下,极间距的增大会降低反应速率和提高膜层的均匀性.结论 极间距的变化会对膜层的生长速率、膜层厚度以及膜层的形貌特征产生很大影响.通过调整合适的极间距可以控制膜层的生长区域,实现膜层的局部优先生长.
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