目的 通过磁过滤阴极弧沉积技术制备质量优异的CrCN涂层.研究乙炔/氮气混合气体流量以及基底偏压对薄膜结构和成分的影响.方法 采用磁过滤真空阴极弧沉积技术,在20~100 mL/min变化的乙炔/氮气混合气体流量参数下沉积CrCN复合薄膜.通过X射线衍射、场发射电子显微镜、扫描探针显微镜、X射线光电子能谱仪、透射电镜,对薄膜的物相结构和形貌进行分析.结果 随着气体流量的增加,CrCN复合薄膜的晶粒逐渐减小最终向非晶化转变.TEM结果表明,在CrCN复合薄膜中有大量几纳米到十几纳米的纳米晶浸没在非晶成分中.SPM表明,随着基底偏压由–200 V增大到–150 V,CrCN薄膜的表面粗糙度Sa由0.345 nm上升至4.38 nm.XPS、TEM和XRD数据表明,薄膜中Cr元素主要以单质Cr、CrN以及Cr3C2的形式存在.结论 采用磁过滤真空阴极弧沉积技术制备的CrCN复合薄膜具有纳米晶-非晶镶嵌结构.该方法沉积的CrCN薄膜的表面粗糙度与基底负偏压有关.混合气体的流量变化对薄膜组分的变化几乎无影响.
The work aims to prepare favorable CrCN coatings by magnetic filtered cathodic arc deposition and study the ef-fects of acetylene/nitrogen gas flow rate and substrate bias on structure and composition of the films. CrCN composite films were deposited by filtered cathodic vacuum arc deposition technique at different C2H2/N2 mixed gas flow rates ranging from 20 mL/min to 100 mL/min. Phase structure and morphology of the films were analyzed by X-ray diffraction, field emission scan-ning electronic microscope, transmission electron microscope, scanning probe microscope, X-ray photoelectron spectroscopy and transmission electron microscope. The amorphous degree of the films increased gradually as the gas flow rate increased; TEM showed that a large number of nanocrystallines immersed in amorphous composition of the CrCN composite films; SPM showed that the surface roughness of CrCN thin films increased from 0.345 nm to 4.38 nm as the substrate bias from increased –200 V to –150 V; XPS, TEM and XRD data showed that the Cr element in the films mainly existed as pure Cr, CrN and Cr3C2. The CrCN composite films prepared by virtue of the magnetic filtered vacuum cathodic arc deposition technology have amorphous-nanocrystalline mosaic structure. The surface roughness of CrCN films is related to the negative bias of the sub-strate. The increase of gas flow rate of mixed gas has little effect on the change of film composition.
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