研究了用强流金属蒸汽弧离子源(MEVVA源)注入Cr对Cu薄膜的抗氧化性能、导电性能和氧化特征的影响.利用X射线衍射、Rutherford背散射和扫描电镜研究了离子注入前后氧化物结构和氧化物形态演变.结果表明,在薄膜的表面层注入一定剂量的Cr能有效地改善Cu薄膜的抗氧化性能,而对薄膜的电导性能无显著影响;离子注入显著影响薄膜表面氧化铜的结构和形态.探讨了离子注入对氧化铜结构和形态的影响机理.
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