利用TEM、XRD、X射线能量散射谱(EDS)、位置敏感原子探针场离子显微镜(PoSAP)等方法研究了脉冲电沉积法制备的块体纳米晶Co-Ni合金的微观组织结果表明:沉积层中Co含量随电解液中Co2+离子浓度增加而显著增加;沉积层合金点阵参数随Co含量的增加按Vegard定律增加,同时晶粒尺寸减小;当晶粒尺寸减小到十几纳米时,出现附加的晶格膨胀效应;脉冲沉积与直流沉积相比,晶粒明显细化;PoSAP操作的在线观测和大量数据的计算机三维重构图表明,Co原子在沉积层中呈均匀分布;FIM观察分析表明纳米晶Co-Ni合金中存在三类晶间结构:正常晶界、非长程有序也非短程有序.的"类气态结构"和少量暗区.
参考文献
| [1] | Richard W. Mater Sci Eng, 1993,68A: 189 |
| [2] | Bai H Y, Jin D, Sun J R. Chin Sci Bull, 1995,40:2148(白海洋,金铎,孙继荣.科学通报,1995,40:2148) |
| [3] | Ping D H,Li D X,Ye H Q,Wu X J.Acta Metall Sin,1995,31:A79(平德海,李斗星,叶恒强,吴希俊.金属学报,1995,31:A79) |
| [4] | Lu K,Sui M L.Acta Metall Mater,1995,43:3325 |
| [5] | Lu K,Zhou F.Acta Metall Sin,1997,33:99(卢柯,周飞.金属学报,1997,33:99) |
| [6] | Xu C K,Yang Z D.Mater Rev,1997,11(4):19(徐承坤,扬中东.材料导报,1997,11(4):19) |
| [7] | Phan N H, Schwartz M, Nohe K. Electrochim Acta, 1994,39:449 |
| [8] | Grimett D L, Schwartz M, Nobe K. J Electrochem Soc,1990,137:3414 |
| [9] | Jing T F, Fu W T, Zhang J W. Chin Sci Bull, 1997,42:2127(荆天辅,付万堂,张静武.科学通报,1997,42:2127) |
| [10] | Miller M K, Smith G D W. Atom Probe Microanalysis: Principles and Applications to Materials Problems. The Material Research Society, USA, 1989:126 |
| [11] | Tu Z M. Principle and Technology of Eletroplating Alloy. Beijing: National Defence Industry Press, 1993:321(屠振密.电镀合金原理与工艺.北京:国防工业出版社,1993:321) |
| [12] | Lu K, Liu X D, Zhang H Y, Hu Z Q. Acta Metall Sin,1995,31:A74(卢柯,刘学东,张皓月,胡壮麒.金属学报,1995,31:A74) |
| [13] | Birringer R, Glein H P. Phys Lett, 1984,102A: 365 |
| [14] | Jayaram R. Jones J W, Miller M K. Appl Surf Sci, 1994,76/77:165 |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%