采用电化学辅助技术在LY12铝合金表面沉积了两种防护性硅烷膜(1,2-二-(三乙氧基硅基)乙烷(BTSE)膜与十二烷基三甲氧基硅烷(DTMS)膜).电化学阻抗谱测试结果显示,经硅烷化处理后铝合金的耐蚀性能得到大幅度提高,并且发现在阴极电位下沉积所得硅烷膜的耐蚀性能较常规"浸涂法"有明显提高;两种硅烷膜均存在一个最佳的"临界阴极电位"(-0.8V),在此电位下制得的膜耐蚀性最佳.扫描电镜观察显示临界电位下所得硅烷膜最为完整致密,电位过正不利于成膜,而电位继续变负膜表面呈现多孔形貌,可能与氢气的生成并溢出破坏表面有关.由于在硅烷分子中含有疏水性较强的十二烷基长链,DTMS膜具有更好的耐蚀性.
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