用原子力显微镜(AFM)观察磁控溅射Cu膜的表面形貌,并基于功率谱密度(PSD)和粗糙度测量方法对薄膜进行了量化表征,研究了薄膜表面演化的动力学标度行为.结果表明:薄膜表面演化具有多尺度特征,在全域和局域呈现两种不同的标度行为.全域的粗糙度指数αg≈0.83,生长指数βg≈0.85;而局域的粗糙度指数α1≈0.88,生长指数β1≈0.26.这种差异揭示了薄膜生长机制的尺度依赖性.薄膜全域表面演化为异常标度行为,这归因于体扩散导致了晶粒几何形态的急剧变化;而局域表面演化呈现表面扩散控制的生长行为.
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