阴极真空弧源沉积氟化类金刚石薄膜的结构与性能研究

无机材料学报, 2005, 20(3): 727-734. doi: 10.3321/j.issn:1000-324X.2005.03.034

阴极真空弧源沉积氟化类金刚石薄膜的结构与性能研究

姚志强 ^1, , 杨萍 ^2, , 孙鸿 ^3, , 王进 ^4, , 冷永祥 ^5, , 陈俊英 ^6, , 黄楠 ^7,

基金项目: 国家重点基础研究发展计划(973计划)(G1999064706) 国家自然科学基金(30370407,30270392)

关键词：氟化类金刚石膜 , 磁过滤阴极真空弧源 , Raman光谱 , 机械性能 , 疏水性能

Structure and Properties of Fluorinated Diamond-like Carbon Films Synthesized by Cathodic Vacuum Arc Source Technology

采用脉冲磁过滤阴极真空弧源沉积系统(FCVA)在单晶硅基片上制备了含氟量不同的一系列氟化类金刚石膜(a-C:F).重点研究了氟掺杂对非晶态碳基薄膜结构、机械性能和疏水性能的影响.薄膜的成分和结构采用X射线光电子能谱仪(XPS)和激光拉曼光谱(Raman)进行了表征,薄膜表面形貌和粗糙度采用原子力显微镜(AFM)进行了分析.使用纳米压痕仪测量了薄膜硬度,纳米划痕仪测量了膜基结合力.采用躺滴法测量薄膜与双蒸水之间的接触角来评价其疏水性能.结果表明,随着CF4流量的逐渐增加,薄膜的氟化程度逐渐增强,膜中最大氟含量达45.6 at%;薄膜呈典型的类金刚石状结构,但薄膜的无序化程度增强;由于-CFn+的刻蚀,薄膜表面更加致密化、粗糙度逐渐减小.薄膜的机械性能良好,硬度在12GPa以上.薄膜的疏水性能得到增强,与双蒸水之间的最大接触角达106,接近于聚四氟乙烯(PTFE,110°).

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阴极真空弧源沉积氟化类金刚石薄膜的结构与性能研究

Structure and Properties of Fluorinated Diamond-like Carbon Films Synthesized by Cathodic Vacuum Arc Source Technology

参考文献