采用取代反应获得了具有Keggin结构的聚合羟基铁铝离子,并通过单分子层技术将聚合羟基离子嵌入到二硫化钼的层间,制得了层间距1.394至1.513nm的柱撑二硫化钼复合材料.研究表明,随着Fe/Al比的增加,层间距逐渐下降,颗粒度逐渐增大,比表面积逐渐降低.催化实验表明,柱撑材料将S2-催化氧化为S2O32-,其催化活性是2H-MoS2的4～5倍,且光催化活性大于催化活性.这与材料比表面积增加所导致催化活性部位的增多,以及光致电子-空穴对的产生有关.
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