在不同基体负偏压作用下,用阴极电弧离子镀等离子体物理气相沉积(PVD)方法在单晶Si(100)基片上获得六方晶系的晶态AlN薄膜用X射线衍射仪分析了沉积膜的物相组成和晶格位向随偏压的变化,在扫描电子显微镜(SEM)下观察沉积膜的显微组织形貌.结果表明,在较小偏压下,AlN膜呈(002)择优取向,表面致密均匀;在较大偏压下,AlN膜呈(100)择优取向,表面形貌则粗糙不平.AlN薄膜的择优取向及表面形貌受到不同偏压下不同离子轰击能量的影响.
参考文献
| [1] | G.A.Slack, J.Phys. Chem. Solids, 34, 321(1973) |
| [2] | K-H.Hellwege, Landolt-Bornstein Numerical Data and Functional Relationships in Science and Technology, Vol.17, (Berlin, Springer-Verlag, 1982) p.158 |
| [3] | P. Martin, R.Netterfield, T.Kinder, A.Bendavid, Appl. Opt., 31, 6734(1992) |
| [4] | W.M.Yim, E.J.Stofko, P.J.Zanzucchi, J.I.Pankove, M.Ettenberg, S.L.Gilbert, J.Appl. Phys., 44(1) |
| [5] | R.Macmahon, J.Affinito, R.J.Parsons, J.Vac. Sci.Technol., 20, 376(1982) |
| [6] | 吴音,缪卫国,刘耀诚,周和平,材料研究学报,12(2),139(1998)(WU Yin, MIAO Weiguo, LIU Yaocheng, ZHOU Heping, Chinese J. Mater. Res., 12(2), 139(1998)) |
| [7] | 陈克新,葛昌纯,曹文斌,李江涛,材料研究学报,13(3),273(1999)(CHEN Kexin, GE Changchun, CAO Wenbin, LI Jiangtao, Chinese J. Mater. Res., 13(3), 273(1999)) |
| [8] | 周和平,陈浩,吴音,缪卫国,刘希,材料研究学报,12(1),25(1998)(ZHOU Heping, CHEN Hao, WU Yin, MIAO Weiguo, LIU Xi, Chinese J. Mater. Res., 12(1), 25(1998)) |
| [9] | T.Shiosaki, T.Yamamoto, T.Oda, A.Kawabata, Appl. Phys. Lett., 36, 643(1980) |
| [10] | Y.G.Roman, A.P.M.Adriaasen, Thin Solid Films, 169, 241(1989) |
| [11] | J.K.Liu, K.M.Lakin, K.L.Wang, J.Appl. Phys., 4(6, 3703(1975) |
| [12] | S.Yoshida, S.Misawa, A.Ito, Appl. Phys. Lett., 26, 461(1975) |
| [13] | H.Lee, J.Y.Lee, J.Mater. Sci.: Mater.in Electro., 8, 385(1997) |
| [14] | J.Yang, C.Wang, X.S.Yan, K.Tao, Y.D.Fan, J.Phy. D:Appl. Phys., 27, 1056(1994) |
| [15] | Y.Murayama, K.Kashiwagi, M.Kikuchi, J.Vac. Sci.Technol., 17(4), 796(1980) |
| [16] | V.Talyansky, R.D.Vispute, R.Ramesh, R.P.Sharma, T.Venkatesen, Y.X.Li, I.G.Salamanca Riba.M.C.Wood, R.T.Lareau, K.A.Jones, A.A.Iliadis, Thin Solid Films, 323, 37(1998) |
| [17] | I.Petrov, L.Hultman, J.E.Aundgren, J.Vac. Sci. Techn., A10(2), 265(1992) |
| [18] | A.R.Navarro, W.O.Rivera, J.M. Garcia-Ruiz, R.Messier, L.J.Pilione, J.Mater. Res., 12(7), 1850(1997) |
| [19] | 王浩,黄荣芳,吴杰,洪瑞江,闻立时,无机材料学报,8(3),321(1993)(WANG Hao, HUANG Rongfang, WU Jie, HONG Ruijiang, WEN Lishi, Chinese J.Inorg. Mater., 8(3).321(1993)) |
| [20] | 杨杰,王晨,陶琨,范玉殿,无机材料学报,8(3),316(1993)(YANG Jie, WANG Chen, TAO Kun, FAN Yudian, Chinese J. Inorg. Mater., 8(3), 316(1993)) |
| [21] | Y.M.Chiang, D.P. Birnie, W.D.Kingery, in "Physical Ceramics ", (John Wiley & Sons, Inc., 1977) p.31 |
| [22] | A.Grill, Cold Plasma in Materials Fabrication, (New York: IEEE Press 1994) p.3 |
| [23] | Joint Committee on Powder Diffraction Standards, "Powder Diffraction File ", (International Center for Powder Diffraction Data, Swartmore, PA,1984), Card No.: 25-1133 |
| [24] | I.Petrov, L.Hultman,U. Helmersson, J.E.Sundgren, J.E.Greene, Thin Solid Films, 169, 299(1989) |
| [25] | 韩立民主编,等离子热处理(天津,天津大学出版社,1997)p.185(HAN Limin,Heat Treatment by Plasma,(Tianjin, Tianjin University Press, 1997) p.185) |
| [26] | "电子工业技术词典>编委会编,(北京,国防工业出版社,1979)p.6～50( < A Technical Dictionary for Electronics > by Committee, (Beijing, National Defence Industry Press,1979) p.6～50) |
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