用双离子束溅射法在玻璃基片上制得了Fe-Ni-N薄膜,研究了Ni含量、主源气氛及退火温度对Fe-Ni-N薄膜的结构、磁性及热稳定性的影响,选择合适的工艺条件,可制得在(100)面方向有100%晶粒取向度的单一γ′-(Fe,Ni)4N相.Ni含量为6.7%(摩尔分数)的Fe-Ni-N薄膜具有较好的软磁性能,其饱和磁化强度Ms为2.04 T,矫顽力Hc为0.68 kA/m.但是随着Ni含量的提高,Fe-Ni-N薄膜的热稳定性下降在主源气压比PN2/PAr较低时,有利于氮含量较低的γ'相的形成,在较高的PN2/PAr条件下,则形成氮含量较高的ε-(Fe,Ni)2~3N相和ξ-(Fe,Ni)2N相.
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