用模拟闭塞电池法(O.C.)研究了青铜在模拟环境介质0.028 mol·L-1NaCl+0.01 mol·L-1Na2SO4+0.016 mol.L-1NaHCO3中的局部腐蚀孔内或裂纹内的化学变化.通电32 h后闭塞区内溶液的Ph值由7.00降至5.02,与此同时Cl-和SO24-向闭塞区内迁移,其浓集倍数分别是6.31和2.93;测定了闭塞区内外Cu、Sn、Pb金属离子的浓度,据此计算出溶解因子fsn/Cu小于1,fpb/Cu大于 1,表明青铜中各元素选择性腐蚀的顺序为Pb＞Cu＞Sn,腐蚀速度Pb＞Cu＞Sn;用XRD分析了腐蚀产物的组成,解释了青铜文物表面腐蚀产物的分层现象,即从里到外为CuCl,CuCl和Cu2O,Cu的二价化合物.
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