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用直流辉光等离子体化学气相沉积制备金刚石厚膜,用氢的微波等离子体对其抛光截面进行刻蚀,研究了晶界对金刚石厚膜耐磨性的影响.结果表明:在金刚石膜的生长过程中,随着甲烷流量的增加,金刚石膜的晶界从纵向排列为主过渡到网状结构,晶粒内部缺陷逐渐增加,杂质、空洞主要分布于晶界处.金刚石膜的磨耗比随着晶界密度、宽度、杂质含量及晶粒内部缺陷的增加而下降.晶界是杂质、空洞主要富集区,是影响金刚石厚膜耐磨性的主要因素.

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