利用纳米压痕技术对沉积在Si衬底上1μm厚Cu膜的硬度H和弹性模量E进行了测量.结果表明,由单一刚度测量(SSM)和连续刚度测量(CSM)2种方法测得的E值基本一致.然而由于Cu膜的室温蠕变行为显著,用SSM方法测得薄膜的H值显著小于用CSM方法测得的H值.对加载曲线进行分析表明,在压入深度为528-587 nm时薄膜硬度显示基体效应,压入深度与薄膜厚度的比值与有限元计算结果吻合较好.
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