采用磁控溅射法在硅基片上制备了Co原子分数为13.0%的Co-C纳米复合薄膜.在真空条件下,对薄膜进行退火处理,退火温度从473 K逐步提高至773 K,保温时间30 min.形貌观察表明,未经退火处理的薄膜中,Co颗粒均匀分布在非晶C基体中,Co颗粒尺寸为1.5-3.0 nm;673 K退火后,Co颗粒尺寸增大.磁性能测试表明,未经退火处理的薄膜磁性较弱,随着退火温度升高,薄膜的磁化强度和矫顽力均明显增大;当退火温度增加至673-773 K时,薄膜呈现出低温铁磁性、室温超顺磁性的典型颗粒体系磁性特征.磁输运特性研究表明,未经退火处理的薄膜在温度为4.2 K,磁场为3980 kA/m时表现出1.33%的负磁电阻,随着退火温度升高,样品磁电阻值下降;电阻与温度关系在4.2-60 K范围内符合lnR-T-1/4线性关系,磁输运遵循变程跳跃(variable range hopping)传导机制.
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