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借助显微硬度测试、电导率测试、浸泡腐蚀实验、SEM,TEM和元素面扫描,研究了T6和T78时效工艺对Al-0.75Mg-0.75Si-0.8Cu(质量分数,%)合金显微结构和性能的影响.结果表明,实验合金在T6峰值时效(180℃,8 h)时,硬度为128.3 HV,电导率为27.3×106 S/m.在T6(180℃,5 h)基础上,分别进行温度为195,205和215℃的二级时效,即T78时效工艺,随二级时效时间的延长,合金硬度总体变化趋势为先降低后升高,而电导率值逐渐增大;最佳T78工艺为(180℃,5 h)+(195℃,2 h),此时合金的硬度最高,为129.2 HV,电导率为27.6×106 S/m.TEM观察发现,T6峰值时效时,晶粒内主要析出针状的β″相,经T78双级时效处理后,晶粒内析出大量的板条状析出相,而晶界无析出带仅稍有变化.T78工艺能在保持力学性能的同时,大幅提高耐晶间腐蚀性能,其原因是晶粒内形成了表面有Cu富集的板条状析出相.晶粒内析出大量板条状强化相,使得合金硬度与T6峰值相当,同时Cu偏聚在析出相与Al基体界面处,促使更多Al基体中的Cu析出,基体与无析出带(PFZ)电位差大大降低,使得其抗晶间腐蚀性能大大提高.

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