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利用直流复合电镀方法将WC纳米颗粒均匀分散到Ni镀层,用微米压痕仪测试了镀层的力学性能,用动电位极化曲线研究了镀层在pH=9.0的0.05 mol/L H3BO3+ 0.075 mol/L Na2B4O7缓冲溶液中的电化学性能.结果表明,与纯Ni镀层相比,纳米复合镀层的晶粒尺寸显著减小,约为21 nm;硬度提高了81%,达到651HV;自腐蚀电流密度降低约一个数量级,约为1.29×10-7A/cm2;破钝电位基本一致,但致钝电位(10 mV)更低,维钝电流密度(1.79×10 6 A/cm2)更小,仅为纯Ni镀层的1/7.利用Mott-Schottky理论结合点缺陷模型分析表明:表面钝化膜仍具有p型半导体特征,WC纳米颗粒显著降低基体Ni的晶粒尺寸,引起钝化膜中点缺陷密度和扩散系数的降低.

参考文献

[1] Balog M,Ke(c)ké(s) J,Sch(o)berl T,Galusek D,Hofer F,K(r)st'n J,Len(c)é(s) Z,Huang J L,(S)ajgal(i)k P.J Eur Ceram Soc,2007;27:2145
[2] Shen G X,Chen Y C,Lin L,Lin C J,Scantlebury D.Electrochim Acta,2005; 50:5083
[3] Zhang H Y,Shan G B,Liu H Z,Xing J M.Surf Coat Technol,2007; 201:6917
[4] Tang W,Lu W J,Luo X,Wang B S,Zhu X B,Song W H,Yang Z R,Sun Y P.J Magn Magn Mater,2010; 322:2360
[5] Bai S L,Chen L Y,Hu J W,Li D Q,Luo R X,Chen A F,Chung C L.Sens Actuators,2011; 159B:97
[6] Zhang S S,Han K J,Cheng L.Surf Coat Technol,2008;202:2807
[7] Wu B,Xu B S,Zhang B,Lii Y H.Surf Coat Technol,2007;201:6933
[8] Zhang M,Lin G Q,Dong C,Kim K H.Curr Appl Phys,2009; 9:S174
[9] Stroumbouli M,Gyftou P,Pavlatou E A,Spyrellis N.Surf Coat Technol,2005; 195:325
[10] Gyftou P,Stroumbouli M,Pavlatou E A,Asimidis P,Spyrellis N.Electrochim Acta,2005; 50:4544
[11] Zhou X W,Shen Y F,Gu D D.Acta Metall Sin,2012; 48:957(周小卫,沈以赴,顾冬冬.金属学报,2012; 48:957)
[12] Ye W,Li Y,Wang F H.Electrochim Acta,2006; 51:4426
[13] Zheng Z J,Gao Y,Gui Y.Corros Sci,2012; 54:60
[14] Han X,Chen J,Sun C,Wu Z W,Wu X C,Zhang X H.Acta Metall Sin,2013; 49:265(韩啸,陈吉,孙成,武占文,吴新春,张星航.金属学报,2013; 49:265)
[15] Meng G Z,Shao Y W,Zhang T,Zhang Y,Wang F H.Electrochim Acta,2008; 53:5923
[16] Vignal V,Oltra R,Verneau M,Coudreuse L.Mater Sci Eng,2001; A303:173
[17] Oliver W C,Pharr G M.J Mater Res,1992; 7:1564
[18] Wu H,Chen T,Wang Q H.J Mater Eng,2011; 12:48(吴化,陈涛,王庆辉.材料工程,2011:12:48)
[19] El Sherik A M,Erb U,Palumbo G,Aust K T.Scr Mater,1992; 27:1185
[20] Chen X H,Chen C S,Xiao H N,Cheng F Q,Zhang G,Yi G J.Surf Coat Technol,2005; 191:351
[21] Garrett C G B,Brattain W H.Phys Rev,1955; 99:376
[22] Sun F L,Meng G Z,Zhang T,Shao Y W,Wang F H,Dong C F,Li X G.Electrochim Acta,2009; 54:1578
[23] Liu L,Li Y,Wang F H.Electrochim Acta,2008; 53:2453
[24] Macdonald D D.J Electrochem Soc,1992; 139:3434
[25] Macdonald D D,Macdonald M U.J Electrochem Soc,1990; 137:2395
[26] Sikora E,Sikora J,Macdonald D D.Electrochim Acta,1996; 41:783
[27] Li N,Li Y,Wang S G,Wang F H.Electrochim Acta,2006;52:760
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