以锆酸丁酯及乙酰丙酮、苯甲酰丙酮为原料, 经溶胶-凝胶工艺, 制备具有负性光刻胶性质的ZrO2光敏溶胶, 在将其与正硅酸乙酯通过水解缩聚反应复合, 采用浸渍提拉法在基片上制得折射率在1.463～1.647之间连续可调的SiO2/ZrO2二元光敏凝胶薄膜.其敏感波长在335nm附近. 通过FTIR分析, 发现凝胶薄膜中含有Si-O-Zr、Zr-O的特征振动峰, 证明SiO2与ZrO2两相在分子尺度上形成了微观组分均匀的薄膜. 利用掩模板结合紫外曝光及显影工艺在凝胶膜上转移了光栅等表面微结构图形.
The SiO2-ZrO2 gel films were formed on silica or K9 glass substrate from the sols that were derived from Zr-butoxide modified chemically with benzoylacetone and then mixed with tetraethyl orthosilicate via sol-gel process. The obtained gel film shows a characteristic absorption band, at around 334nm. The Si-O-Zr, Zr-O bands were detected by FTIR. The negative tone gel film was irradiated with high pressure mercury lamp through the mask and then leached in ethyl alcohol. The above process gave uniform surface-relief gratings of different patterns with different masks. The present study has proved that the photosensitive gel films are versatile in fabrication of micro optical devices.
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