欢迎登录材料期刊网

材料期刊网

高级检索

以三氯甲烷为溶剂, 氨丙基三甲氧基硅烷(APTMS)为修饰剂通过后接枝法对周期性介孔氧化硅材料(PMOs)进行修饰. 通过固态NMR、氮气吸附、元素分析和UV-vis吸光度测试等手段来表征材料. 结果表明, 氨丙基基团通过共价连接的方式成功修饰到PMOs材料. 尽管随着APTMS修饰量的增加, 比表面积、孔容和孔径都呈下降趋势, 但经25%APTMS修饰的PMOs材料依然具有良好的介孔结构, 其表面积为604m2·g-1, 孔容为0.62cm3·-1, 孔径狭窄分布在4.5~5.0nm之间. 修饰后的PMOs对氯金酸有明显的吸附作用.

Aminopropyl groups were used to functionalize the pore channels of periodic mesoporous organosilicas(PMOs) by the post-grafting method. The final materials were investigated by means of XRD, TEM, solid-state NMR, N2 adsorption and Elementar Analysis. The results show that bridging groups in the framework do not cleave and amino groups are attached covalently to the pore wall of periodic mesoporous organosilica after functionalization. The mesoscopic order remains good with increasing aminopropyl groups coverage up to 25mol%. The surface area, pore volume and pore size tend to decrease as the concentration of APTMS increases, but the materials with 25mol% aminopropyl groups still preserve a desirable pore structure, with surface area of 604m 2·-1, pore volume of 0.62cm3·-1 and sharp pore size distribution centered between 4.5nm and 5nm. Aminopropyl-functionalized PMOs facilitates absorption of (HAuCl)-complex.

参考文献

[1] Hatton B, Landskron K, Whitnall W, et al. Acc. Chem. Res., 2005, 38 (4): 305--312.
[2] Olkhovyk O, Jaroniec M. J. Am. Chem. Soc., 2005, 127 (1): 60--61.
[3] Kickelbick G. Angew. Chem. Int. Ed., 2004, 43 (24): 3102--3104.
[4] Landskron K, Hatton B D, Perovic D D, et al. Science, 2003, 302 (5643): 266--269.
[5] Zhu H G, Dai S, Steven H, et al. J. Phys. Chem., 2003, 19 (26): 3974--3980.
[6] 张 峰, 张 歆(ZHANG Feng, et al). 无机材料学报(Journal of Inorganic Materials), 2006, 21 (5): 1268--1272.
[7] Mangesh T, Hien N, Elish E, et al. J. Phys. Chem. B., 2005, 109 (7): 2873--2880.
[8] Guo W P, Park J Y, Cho W J, et al. Chem. Mater., 2003, 15 (12): 2295--2298.
[9] Wang Y, Zibrowius B, Yang C, et al. Chem. Commun., 2004, (1): 46--47.
[10] Guan S, Inagaki S, Ohsuna T, et al. Micro. Meso. Mater, 2001, 43 (2): 165--172.
[11] Yu D C, Yang J S, Xie J X. Analysis of NMR Spectrum. Chemical Industry Press. 1989. 476, 542,548.
[12] Moreau J J, Vellutini L, Bied C, et al. Chem. Eur. J., 2003, 9 (7): 1594--1599.
[13] Bao X Y, Zhao X S, Li X, et al. J. Phys. Chem. B., 2004, 108 (15): 4684--4689.
[14] Tsung C K, Hong W B, Stuck G D, et al. Adv. Funct. Mater, 2006, 16 (17): 2225--2230.
[15] Liu A M, Hidajat K, Kawi S, et al. Chem. Commun, 2000, (13): 1145--1146.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%