采用反应脉冲激光沉积方法(PLD)分别在n-Si(100)和Pt/Ti/SiO2/Si(111)衬底上生长了Ni-Al-O栅介质薄膜,将样品在不同温度下进行快速退火处理.通过XRD和AFM对其结构和表面形貌进行了表征,利用LCR表和Keithley表对其介电性能和漏电流进行了研究.结果表明,样品经过750℃退火后仍然保持非晶状态,且样品的表面平整,均方根粗糙度小于0.5 nm.在1 MHz测试频率下,由Pt/Ni-Al-O/Pt电容器测得的介电常数为9.9.MOS电容器的电学测试显示,700℃以上退火的样品有较高的电容值,较低的漏电流密度.研究表明,Ni-A1-O薄膜是一种有潜力的新型高k栅介质材料.
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