欢迎登录材料期刊网

材料期刊网

高级检索

采用气溶胶辅助化学气相沉积(AACVD)法在玻璃衬底上制备了Al掺杂ZnO(AZO)薄膜.研究了Al掺杂(2at%~8at%)对ZnO薄膜结构及光电性能的影响.利用XRD、SEM、EDAX、紫外可见分光光度计等手段对样品进行测试.结果表明,制备的所有AZO薄膜均具有纤锌矿结构,不具有沿c轴方向的择优取向,XRD图谱中未观察出Al的相关分相.在可见光范围内,AZO薄膜的平均透过率大于72%,光学禁带宽度随Al掺杂量的增加而变窄.同时根据四探针技术所得的数据得知:Al的掺杂导致薄膜方块电阻的变化,随着A1掺杂量的增加,方块电阻有明显变小的现象,掺杂6at%A1的AZO薄膜具有最低方块电阻(18Ω/□).

参考文献

[1] Oda J,Nomoto J,Miyata T,et al.Improvements of spatial resistivity distribution in transparent conducting Al-doped ZnO thin films deposited by DC magnetron sputtering.Thin Solid Films,2010,518(11):2984-2987.
[2] Tsai Y Z,Wang N F,Tsai C L,Heavens S N,et al.Fluorine-doped ZnO transparent conducting thin films prepared by radio frequency magnetron sputtering.Thin Solid Films,2010,518(17):4955-4959.
[3] Wellings J S,Chaure N B,Heavens S N,et al.Growth and characterization of electrodeposited ZnO thin films.Thin Solid Films,2008,516(12):3893-3898.
[4] Preetam Singh,Ajay Kaushal,Davinder Kaur.Mn-doped ZnO nanocrystalline thin films prepared by ultrasonic spray pyrolysis.Journal of Alloys and Compounds,2009,471(1/2):11-15.
[5] Sahal M,Hartiti B,Ridah A,et al.Structural,electrical and optical properties of ZnO thin films deposited by Sol-Gel method.Microelectronics Journal,2008,39(6):1425-1428.
[6] 陈新亮,薛俊明,张德坤,等(CHEN Xin-Liang,et al).衬底温度对MOCVD法沉积ZnO透明导电薄膜的影响.物理学报(Acta Physica Sinica),2007,56(3):1563-1567.
[7] 高珊,谷景华,张跃(GAO Shan,et al).溶剂热法制备铝掺杂的氧化锌透明导电薄膜.无机化学学报(Chinese J.Inorg.Chem.),2010,26(1):55-60.
[8] Tahir A A,Wijayantha K G U,Mazhar M,et al.ZnFe2O4 thin films from a single source precursor by aerosol assisted chemical vapour deposition.Thin Solid Films,2010,518(14):3664-3668.
[9] Piccirillo C,Binions R,Parkin I P.Synthesis and characterization of W-doped VO2 by aerosol assisted chemical vapour deposition.Thin Solid Films,2008,516(8):1992-1997.
[10] Venkatachalam S,Iida Y,Kanno Y.Preparation and characterization of Al doped ZnO thin films by PLD.Superlattices and Microstructures,2008,44(1):127-135.
[11] Sahu D R,Lin S Y,Huang J L.Improved properties of Al-doped ZnO film by electron beam evaporation technique.Microelectronics Journal,2007,38(2):245-250.
[12] Liu H X,Qiu H,Chen X,et a/.Structural and physical properties of ZnO:Al films grown on glass by direct current magnetron sputtering with the oblique target.Current Applied Physics,2009,9(6):1217-1222.
[13] Liu C P,Jeng G R.Properties of aluminum doped zinc oxide materials and sputtering thin films.Journal of Alloys and Compounds,2009,468(1/2):343-349.
[14] Wang M S,Lee K E,Hahn S H,et al.Optical and photoluminescent properties of Sol-Gel Al-doped ZnO thin films.Materials Letters,2007,61(4/5):1118-1121.
[15] Babu B J,Maldonado A,Velumani S,et al.Electrical and optical properties of ultrasonically sprayed Al-doped zinc oxide thin films.Materials Science and Engineering B,2010,174(1/2/3):31-37.
[16] Emin Bacaksiz,Serder Aksu,Yllmaz S,et al.Structural,optical and electrical properties of Al-doped ZnO microrods prepared by spray pyrdysis.Thin Solid Films,2010,518(15):4076-4080.
[17] 兰伟,唐国梅,曹文磊,等(LAN Wei,et al).Ni掺杂ZnO薄膜的结构与光学特性研究.物理学报(Acta Physica Sinica),2009,58(12):8501-8505.
[18] Saha B,Das S,Chattopadhyay K K.Electrical and optical properties of Al doped cadmium oxide thin films deposited by radio frequency magnetron sputtering.Solar Energy Material & Solar Cells.2007,91(18):1692-1697.
[19] 伞海生,李斌,冯博学,等(SAN Hai-Sheng,et al).由缺陷引起的Burstein-Moss和带隙收缩效应对CdIn2O4透明导电薄膜光带隙的影响.物理学报(Acta Physica Sinica),2005,54(2):842-847.
[20] Rusu G G,R(a)mbu A 1,Buta V E,et al.Structural and optical charactetization of Al-doped ZnO films prepared by thermal oxidation of evaporated Zn/Al multilayered films.Materials Chemistry and Physics,2010,123(1):314-321.
[21] 陈兆权,刘明海,刘玉萍,等(CHEN Zhao-Quan,et al).PECVD 制备AZO(ZnO:Al)透明导电薄膜.物理学报(Acta Physica Sinica),2009,58(6):4260-4267.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%