在铜基体上沉积铬-金刚石复合过渡层, 用热丝CVD系统在复合过渡层上沉积连续的金刚石涂层. 用扫描电镜(SEM)、X射线(XRD)、拉曼光谱及压痕试验对所沉积的镶嵌结构界面金刚石膜的相结构及膜/基结合性能进行了研究. 结果表明, 非晶态的电镀Cr在CVD过程中转变成Cr3C2, 由于金刚石颗粒与Cr3C2的相互咬合作用, 金刚石膜/基结合力高; 在294 N载荷压痕试验时, 压痕外围不产生大块涂层崩落和径向裂纹, 只形成环状裂纹.
The diamond films were fabricated by using a two-step process on copper substrates. Firstly, chromium (Cr)-diamond composite interlayer was electroplated on copper substrates, then continuous diamond films were deposited by using hot-filament chemical vapor deposition (HFCVD) method. The interfacial characteristics were investigated by indentation test. The film surface morphology, phase structure and inner stress were analyzed by scanning electron microscope (SEM), X-ray diffraction (XRD) and Raman spectrum. The results show that the diamond particles are deeply imbedded in chromium layer and the amorphous Cr in the composite interlayer is carborized to Cr3C2 in the CVD process. Low inner stress is detected in the diamond films and good adhesive strength between film and substrate is obtained due to the deep anchoring of the diamond particles in the Cr3C2 matrix. Concentric cracks but no delaminate area and radial cracks are observed on the periphery of the indentation in 294 N load indentation test.
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