近几年,图形化蓝宝石衬底因其作为GaN基发光二极管外延衬底,不仅能降低GaN外延薄膜的线位错密度,还能提高LED的光提取效率而引起国内外许多科研机构的广泛研究兴趣.本文综述了图形化蓝宝石衬底提高GaN基发光二极管性能的作用机理,重点评述了目前图形化蓝宝石衬底的制备方法(湿法刻蚀、干法刻蚀、固相反应)和图形尺寸(微米图形化、纳米图形化),分析比较了不同制备方法和图形尺寸制备蓝宝石图形衬底对GaN基发光二极管性能改善,最后针对蓝宝石图形衬底制备存在的问题对其今后的发展方向做出了展望.
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