为了保证核能源的使用安全,对氚在第一壁材料表面的滞留数量以及深度进行定量表征非常重要.在本研究中,制备了一系列潜在的第一壁材料B4C/Mo涂层,并采用成像板(IP)和β射线激发X射线(BIxs)法对其表面的氚滞留情况进行了测定.IP图像表明,涂层表面吸附的氚含量遵循以下顺序:B4C＞BM 15＞BM5＞Mo.而BIXS结果进一步表明,对于B4C涂层,大部分氚扩散到了涂层内部；而对于其他三种涂层,氚仅在其表面发生吸附.扫描电镜(SEM)结果显示,B4C涂层气孔率最高,而其他三种涂层尽管气孔率较低,但其截面仍能观察到大量气孔和微裂纹的存在.涂层中的这些缺陷为氚的吸收和扩散提供了通道,而气孔与微裂纹的尺寸最终决定了氚在涂层表面的吸附数量.实验结果还表明,涂层杂质成分Ti的存在也对氚的滞留产生了一定影响.
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