离轴磁控溅射法生长1-3维PZT-NFO纳米复合薄膜

无机材料学报, 2014, 29(4): 371-376. doi: 10.3724/SP.J.1077.2013.13363

离轴磁控溅射法生长1-3维PZT-NFO纳米复合薄膜

张辉 ^1, , 马永军 ^2, , 王艺程 ^3, , 文丹丹 ^4, , 叶飞 ^5, , 白飞明 ^6,

1.电子科技大学电子薄膜与集成器件国家重点实验室,成都,610054

2.包头市第二热电厂,包头,014030

3.电子科技大学电子薄膜与集成器件国家重点实验室,成都,610054

4.电子科技大学电子薄膜与集成器件国家重点实验室,成都,610054

5.大连理工大学材料科学与工程学院,大连,116024

6.电子科技大学电子薄膜与集成器件国家重点实验室,成都,610054

基金项目: 中央高校科研业务费资助项目(ZYGX2010X009) National Basic Research Program of China(2012CB933104) Fundamental Research Funds for the Central Universities(ZYGX2010X009) 国家自然科学基金(61271031) National Science Fund of China(61271031) 国家重大基础研究资助项目(2012CB933104)

关键词：纳米复合 , 磁电效应 , 磁控溅射 , 自组装

Preparation of 1-3 Dimensional PZT-NFO Nanocomposite Films by Off-axis Magnetron Sputtering

Keywords： nanocomposite , magnetoelectric effect , magnetron sputtering , self-assembly

采用90°离轴磁控溅射法,在MgAl2O4(001)单晶基片上自组装生长了Pb(Zr0.52Ti0.48)O3-NiFe2O4 (PZT-NFO)复合磁电薄膜,并研究了基片温度、氩氧比和溅射功率等因素对薄膜结构和性能的影响.结果表明,适合生长PZT-NFO薄膜的条件为基片温度800℃,氩氧比1∶1,溅射功率160 W.XRD测试显示,PZT-NFO薄膜为外延生长薄膜,且PZT相与NFO相之间的垂直晶格失配非常小.AFM和SEM结构观察表明,薄膜具有清晰的1-3维纳米复合结构,铁磁相NFO纳米柱直径约为80～150 nm.降低氩氧比有助于NFO相的形成,但溅射功率过大会造成1-3维结构向无规则0-3维结构转变.磁性能测量表明纳米复合薄膜的饱和磁化强度在120～160 kA/m之间,低于块体的NFO相,可能是由于两相的界面扩散所造成.

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