应用聚苯乙烯/氯硅烷复合材料作为栅绝缘层的界面修饰层制备了高性能的并五苯场效应晶体管.原子力显微镜观察发现,界面修饰对并五苯半导体薄膜的生长形貌产生了很大影响.在空白二氧化硅上沉积的并五苯晶粒尺寸都小于150 nm,而在修饰过后二氧化硅的表面生长的并五苯晶粒尺寸多在200～400nm.大的晶粒尺寸能够减小晶粒间的界面,从而有效提高电学性能.表面改性的并五苯场效应晶体管的关态电流约为10-10 A,电流的开关比超过10 6,最大场效应迁移率约可达1.23 cm2·V-1·s-1,而未处理的晶体管的场效应迁移率仅有0.011 8 cm2·V-1·s-1.
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