在纯平的陶瓷衬底上面，利用磁控溅射方法镀上一层金属钛。对金属钛层进行表面缺陷处理后，放入微波等离子体化学气相沉积腔中，利用正交实验方法制备出场发射性能最优的薄膜，通过扫描电镜、X射线衍射仪、拉曼光谱仪等仪器，研究了薄膜的微观表面形态、结构组成等，得到了该薄膜是球状微米金刚石薄膜的结论。并进一步研究了最优场发射薄膜的发射机理。
A layer of thick metal titanium is plated on the flat ceramic substrate by the method of mag-netron sputtering.After processing,the surface defect of metal titanium layer put in the cavity of mi-crowave plasma chemical vapor deposition.Using the method of orthogonal experiment,the thin film of best emission is prepared.By scanning electron microscopy,X-ray diffraction instrument,Raman spectroscopy instrument,the thin film is analyzed.The conclusion of the film is globular micron dia-mond film.And the film mechanism of field emission is studied.
参考文献
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