溅射电压和铝掺杂对透明导电氧化锌薄膜性能的影响

1.北京服装学院基础部,北京100029

2.中国科学院等离子体物理所,合肥230031

Influence of Sputtering Voltage and Al Dopping on Electrical and Optical Characteristics of Transparent Conducting ZnO Thin Film

研究了用微波ECR等离子体反应溅射制备透明导电氧化锌薄膜工艺中靶压及铝的掺入对薄膜电阻率和透光率的影响, 制得电阻率为10-5 Ω.m数量级, 可见光平均透光率大于80%的透明导电ZnO∶Al (AZO) 膜.

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