利用质量分离的低能离子束技术,获得了Fe组分渐变的Fe-Si薄膜.利用俄歇电子能谱法(AES)、 X射线衍射法(XRD)以及X射线光电子能谱法(XPS)测试了薄膜的组分、结构特性.测试结果表明,在室温下制备的Fe-Si薄膜呈非晶态.非晶薄膜在400 ℃下退火20 min后晶化,没有Fe的硅化物相形成.退火后Fe-Si薄膜的Fe组分从表面向内部逐渐降低.
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