采用KF-KCl-K2TiF6-KBF4和LiF-KF-NaF-K2TiF6-KBF4熔盐体系,利用直流和脉冲电源在石墨基体上制备了TiB2镀层.采用金相显微镜观察了镀层的厚度,用X射线衍射分析了镀层的组成,用扫描电镜观察了镀层的表面形貌.实验结果表明:在LiF-KF-NaF-K2TiF6-KBF4熔盐体系,当K2TiF6:KBF4为1:4(摩尔比),脉冲电流幅度为0.45 A·cm-2,脉冲宽度为85ms,脉冲间隔为17 ms时,得到的镀层致密、无裂纹、与基体的结合力很好、有金属光泽、TiB2的纯度高.
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