采用脉冲激光沉积法在Si(111)基片上制备了ZnO薄膜.利用X射线衍射、光致发光、扫描电子显微镜等表征技术研究工作氧压对ZnO薄膜的结晶特性和光学性能的影响.研究结果表明,氧压的增大,有助于更多的氧原子进入晶格,有效减少薄膜中的缺陷和应力,使ZnO薄膜结构趋于完整,但是过高的氧压将严重地影响薄膜的沉积速率,加剧衬底Si的氧化,从而使薄膜的结晶质量恶化.所有的ZnO薄膜均显示出较强的紫外发光蜂,并且结晶性与发光特性有很好的一致性.
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