采用电子束蒸发和磁控溅射两种工艺在移动的Ni-5W合金基带上制备了Y2O3隔离层,研究了镀膜过程中基带移动速度对隔离层性能的影响,同时详细比较了两种镀膜方法.利用扫描电镜、X射线衍射等手段对Y2O3隔离层进行了分析.结果表明:通过严格控制工艺条件,两种方法都能在移动Ni-5W合金基带上制备高立方织构、表面致密光滑的Y2O3隔离层.研究发现,电子束蒸发工艺中,理想的基带移动速度是0.4～1.0 mm·s-1;磁控溅射工艺中,适宜的基带移动速度应该是0.5～2.0mm·s-1.
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