通过离子注入技术在铝中引入C,He两元素,并采用氦热脱附谱(THDS)研究了C掺杂对铝中氦行为的影响.注He纯铝的THDS中存在四个氦释放区间,分别归于小间隙环的解离、位错环的合并、位错环的皱缩及氦泡向样品表面的迁移.C掺杂后,铝中形成了高热稳定性的HenVmCx型复合物,造成样品中气体释放延迟.然而,随着C掺杂剂量的增加,THDS谱发生显著改变,低温区出现明显的释放峰,且C掺杂量越高,低温区的释放峰个数越多.
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