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采用沉淀法制备出平均粒径约90 nm的Cu-CeO2粉末.将所得的纳米复合Cu-CeO2粉末经真空热压工艺处理制成纳米复合Cu-CeO2阴极.利用SEM及XRD分析方法对其显微组织进行了研究,结果显示:用沉淀法制备的Cu-CeO2阴极组织较均匀,CeO2粒子晶粒大多在100 nm,呈长圆状分布在Cu基体中.真空电弧实验研究表明纳米复合Cu-CeO2阴极击穿点分布在阴极表面的大部分面积上,阴极斑点细小分散,且击穿优先发生在CeO2相上,导致表面烧蚀较常规材料轻微.

参考文献

[1] Jüttner B .Cathode spots of electric arcs[J].J Phys D:Ap-pl Phys,2001,34:R103.
[2] Boxman R.L.;Goldsmith S. .Twenty-five years of progress in vacuum arc research and utilization[J].IEEE Transactions on Plasma Science,1997(6):1174-1186.
[3] Miller H C .Cathode ions from microsecond aluminum vacuum arcs[J].Journal of Applied Physics,1989,66(03):1107.
[4] 卢平,沈春英,丘泰.掺杂氧化铈钡钨阴极的结构和发射性能的研究[J].稀有金属,2008(01):50-53.
[5] Benilov M S .Theory and modeling of arc cathodes[J].Plasma Sources Science and Technology,2002,11:A49.
[6] Wang Fazhan;Zhuge Fei;Zhang Hui;Ding Bingjun .Effect of high content nano-thoria addition on the properties of tungsten electrode[J].Materials Research Bulletin,2003,38:629.
[7] Wang Yaping;Ding Bingjun .The preparation and properties of microcrystalling and nanocrystalline CuCr contact materials[J].IEEE Transaction on CPT,1999,22(03):467.
[8] Halbritter J .On contamination on electrode surfaces and electric field limitations[J].IEEE Transactions on Electrical Insulation,1985,EI-20(04):671.
[9] Jüttner B;Putsch H;Shilov V A .The influence of surface roughness and surface temperature on arc spot movement in vacuum[J].Journal of Physics D:Applied Physics,1984,17:L31.
[10] Nikolaev A G;Oks E M;Yushkov G Y .Effect of residual gas on the ion charge distribution in vacuum arc discharge plasmas[J].Technical Physics,1998,43(09):1031.
[11] Laferty J M.Vacuum Arcs:Theory and Application[M].New York:wiley,1980
[12] Slade P.G. .Advances in material development for high power, vacuum interrupter contacts[J].IEEE Transactions on Components, Packaging, and Manufacturing Technology. Part A,1994(1):96-106.
[13] 承欢;江剑平.阴极电子学[M].西安:西安电讯工程学院出版社,1986:90.
[14] Gleiter H;Weissmüller J;Wollersheim O;Würschum R .Nanocrystalline materials:a way to solids with tunable electronic structures and properties[J].Acta Materialia,2001,49:737.
[15] Fursey GN. .Field emission in vacuum micro-electronics[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2003(1/4):113-134.
[16] Rossi M C;Salvatori S;Ascarelli P;Cappelli E Orlaodo S .Effect of nanestrocture and back contact material on the field e-mission properties of carbon films[J].Diamond and Related Materials,2002,11:819.
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