用简单的电化学方法制备出了机械性能较强的CuI半导体膜,这种半导体膜是由大量的三角形片状微粒组成的. 利用交流阻抗方法在pH值分别为0、2、4和7的0.5 mol/L Na2SO4溶液中研究了这种膜电极的电化学性质. 研究发现,溶液pH值对CuI半导体膜的阻抗有较大的影响,pH值越小则电化学反应电阻就越大;同时,溶液的pH值也对CuI半导体膜电极的表面态有着较大的影响,pH值越大表面态密度越大. 在pH值为0的Na2SO4溶液中测得CuI半导体的Efb为0.023 V(vs.SCE).
参考文献
[1] | Zheng-Johansson J X M,McGreevy R L.Solid State Ionics[J],1996,83:35 |
[2] | Zheng-Johansson J X M,Ebbsjo I,McGreevy R L.Solid State Ionics[J],1995,82:115 |
[3] | Buhrer W,Halg W.Electrochim Acta[J],1977,22:701 |
[4] | Bouhafs B,Heireche H,Sekkal W,et al.Phys Lett A[J],1998,240:257 |
[5] | Sekkal W,Zaoui A.Physica B[J],2002,315:201 |
[6] | Tennakone K,Kumara G R R A,Kottegoda I R M,et al.Solar Energy Mater Sol Cells[J],1998,55:283 |
[7] | Tennakone K,Kumara G R R A,Kumarasinghe A R,et al.Semicond Sci Tech[J],1995,10:1 689 |
[8] | Perera V P S,Tennakone K.Solar Energy Mater Sol Cells[J],2003,79:249 |
[9] | Kumara G R R A,Kono A,Sahiratsuchi K,et al.Chem Mater[J],2002,14:954 |
[10] | Hsiao G S,Anderson M G,Gorer S,et al.J Am Chem Soc[J],1997,119:1 439 |
[11] | Tennakone K,Kumarasinghe A R,Sirimanne P M,et al.J Photochem Photobiology[J],1995,91:59 |
[12] | Sirimanne P M,Rusop M,Shirata T,et al.Chem Phys Lett[J],2002,66:485 |
[13] | Sirimanne P M,Rusop M,Shirata T,et al.Mater Chem Phys[J],2003,80:461 |
[14] | WANG Rong-Rong(王荣荣),MA Ru-Shen(马如森),WANG Qian(王谦),et al.Rock Mineral Anal(岩矿测试)[J],1998,17(4):259 |
[15] | Sunde S,Hagen G,Odegard R.J Electroanal Chem[J],1993,345:59 |
[16] | Bard A J,Faulkner L R.Electrochemical Methods-Fundamentals and Applications[M].New York:John Wiley,2001:751 |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%