材料期刊网

合成了6种适用于248 nm光致抗蚀剂的硫鎓盐产酸剂,其中吩噻(噁)体系的产酸剂为自行设计合成. 利用IR、H NMR、UV等测试技术进行了结构表征和紫外吸收测定,各化合物的最大紫外吸收在250～285 nm之间,吸收域较宽,适用性较强.同时,利用酸敏染料罗丹明B遇酸异构变色的特点,使用紫外!可见分光光度计定量检测了6种产酸剂在乙腈溶剂中的产酸效率,其中硫杂蒽酮系列的产酸剂产酸性能最好. 最后使用荧光追踪法研究了溶剂极性对产酸效率的影响,发现产酸剂的产酸性能同溶剂的选取密切相关,随着溶剂极性的减小,产酸效率随之降低. 对6种硫鎓盐的产酸效率检测结果可以为产酸剂进一步用于248 nm光致抗蚀剂配方提供详细的参考.

Six sulfonium photoacid generators(PAGs) which were used in 248 nm photoresists were synthesized, some of which were innovated by our lab for the first time. The synthesis method is very simple and environment-friendly, with high yields at the same time. All the PAGs were identified by IR, HNMR and UV. The max wavelengths of ultraviolet absorption are between 250 nm and 285 nm, and the absorption region are so wide that these PAGs can be used extensively. We used rhodamine B and ultraviolet spectrophotometer to evaluate the acid-generation efficiency of the PAGs in acetonitrile because rhodamine B will change colour by the change of acid concentration. The PAGs synthesized by thioxanthen-9-one and isopropylthioxanthen-9-one were choosed as the best ones. We also studied how the solvent affect the acid-generation by fluorescence, and found that the acid-generation efficiency would be depressed by the decrease of the solvent′s polarity. All the work about the PAGs can provide an important reference to 248 nm photoresists.